Construction of membrane sieves using stoichiometric and stress-reduced Si 3N 4/SiO 2/Si 3N 4 multilayer films and their applications in blood plasma separation

Dae Sik Lee, Yo Han Choi, Yong Duk Han, Hyun C. Yoon, Shuichi Shoji, Mun Youn Jung

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

The novelty of this study resides in the fabrication of stoichiometric and stress-reduced Si 3N 4/SiO 2/Si 3N 4 triplelayer membrane sieves. The membrane sieves were designed to be very flat and thin, mechanically stressreduced, and stable in their electrical and chemical properties. All insulating materials are deposited stoichiometrically by a low-pressure chemical vapor deposition system. The membranes with a thickness of 0.4 μm have pores with a diameter of about 1 μm. The device is fabricated on a 6" silicon wafer with the semiconductor processes. We utilized the membrane sieves for plasma separations from human whole blood. To enhance the separation ability of blood plasma, an agarose gel matrix was attached to the membrane sieves. We could separate about 1 μL of blood plasma from 5 μL of human whole blood. Our device can be used in the cell-based biosensors or analysis systems in analytical chemistry.

Original languageEnglish
Pages (from-to)226-234
Number of pages9
JournalETRI Journal
Volume34
Issue number2
DOIs
Publication statusPublished - 2012 Apr 1

Keywords

  • Membrane sieves
  • Plasma separation
  • Si N /SiO /Si N
  • Stoichiometric

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Computer Science(all)
  • Electrical and Electronic Engineering

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