Copper multilayer interconnection using ultravaiolet nanoimprint lithography with a double-deck mold and electroplating

Noriyasu Nagai, Hiroshi Ono, Katsuyuki Sakuma, Mikiko Saito, Jun Mizuno, Shuichi Shoji

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

An approach to realizing a two-step interconnection using a double-deck quartz mold based on ultraviolet nanoimprint lithography (UV-NIL) technology and Cu electroplating is discussed. The double-deck mold realizes a two-step simultaneous transcription and a two-step nanoscale interconnection. Nanoscale via and trench array patterns of Cu were formed on a silicon substrate using UV-NIL in combination with electroplating. Imprinted via and trench patterns were simultaneously formed on a photocurable resin by the double-deck mold with a two-step structure. Using this mold, 73nm metal via and 190nm metal trench patterns were successfully fabricated by electroplating.

Original languageEnglish
Article number115001
JournalJapanese Journal of Applied Physics
Volume48
Issue number11
DOIs
Publication statusPublished - 2009

Fingerprint

Nanoimprint lithography
electroplating
Electroplating
Multilayers
lithography
Copper
copper
Transcription
Metals
Quartz
Resins
metals
resins
Silicon
quartz
Substrates
silicon

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Copper multilayer interconnection using ultravaiolet nanoimprint lithography with a double-deck mold and electroplating. / Nagai, Noriyasu; Ono, Hiroshi; Sakuma, Katsuyuki; Saito, Mikiko; Mizuno, Jun; Shoji, Shuichi.

In: Japanese Journal of Applied Physics, Vol. 48, No. 11, 115001, 2009.

Research output: Contribution to journalArticle

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