DC and RF characteristics in Al2O3/Si 3N4 insulated-gate AlGaN/GaN heterostructure field-effect transistors

Narihiko Maeda, Takashi Makimura, Takashi Maruyama, Chengxin Wang, Masanobu Hiroki, Haruki Yokoyama, Toshiki Makimoto, Takashi Kobayashi, Takatomo Enoki

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Al2O3/Si3́N4 insulated-gate AlGaN/GaN heterostructure field-effect transistors (HFETs) have been fabricated, where excellent RF characteristics have been obtained in addition to the low gate leakage current as the result of employing the metal-insulator-semiconductor (MIS) structure. In an HFET with a gate length (Lg) of 0.1 μm, the cutoff frequency (fT) and maximum oscillation frequency (fmax) were estimated to be 70 and 90 GHz, respectively. The drain current density (Id) and transconductance (gm) were 1.30 A/mm and 293mS/mm, respectively. The gate leakage current (Ig) was as low as 4 × 10-5 A/mm even at a forward bias voltage of +3 V.

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume44
Issue number20-23
DOIs
Publication statusPublished - 2005
Externally publishedYes

Fingerprint

High electron mobility transistors
Leakage currents
field effect transistors
direct current
Gates (transistor)
Drain current
Cutoff frequency
Transconductance
Bias voltage
leakage
Current density
Semiconductor materials
MIS (semiconductors)
transconductance
Metals
cut-off
current density
oscillations
electric potential

Keywords

  • AlO
  • AlGaN
  • Cutoff frequency (f)
  • GaN
  • Gate leakage current
  • HFET
  • Insulated-gate
  • Maximum oscillation frequency (f)
  • Metal-insulator-semiconductor (MIS)
  • SiN

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

DC and RF characteristics in Al2O3/Si 3N4 insulated-gate AlGaN/GaN heterostructure field-effect transistors. / Maeda, Narihiko; Makimura, Takashi; Maruyama, Takashi; Wang, Chengxin; Hiroki, Masanobu; Yokoyama, Haruki; Makimoto, Toshiki; Kobayashi, Takashi; Enoki, Takatomo.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 44, No. 20-23, 2005.

Research output: Contribution to journalArticle

Maeda, Narihiko ; Makimura, Takashi ; Maruyama, Takashi ; Wang, Chengxin ; Hiroki, Masanobu ; Yokoyama, Haruki ; Makimoto, Toshiki ; Kobayashi, Takashi ; Enoki, Takatomo. / DC and RF characteristics in Al2O3/Si 3N4 insulated-gate AlGaN/GaN heterostructure field-effect transistors. In: Japanese Journal of Applied Physics, Part 2: Letters. 2005 ; Vol. 44, No. 20-23.
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abstract = "Al2O3/Si3́N4 insulated-gate AlGaN/GaN heterostructure field-effect transistors (HFETs) have been fabricated, where excellent RF characteristics have been obtained in addition to the low gate leakage current as the result of employing the metal-insulator-semiconductor (MIS) structure. In an HFET with a gate length (Lg) of 0.1 μm, the cutoff frequency (fT) and maximum oscillation frequency (fmax) were estimated to be 70 and 90 GHz, respectively. The drain current density (Id) and transconductance (gm) were 1.30 A/mm and 293mS/mm, respectively. The gate leakage current (Ig) was as low as 4 × 10-5 A/mm even at a forward bias voltage of +3 V.",
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AU - Wang, Chengxin

AU - Hiroki, Masanobu

AU - Yokoyama, Haruki

AU - Makimoto, Toshiki

AU - Kobayashi, Takashi

AU - Enoki, Takatomo

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