Deposition of thin nanoporous silica layers on solid surfaces

Makoto Ogawa, Naoki Shimura, André Ayral

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

A new and versatile method to prepare nanoporous silica thin layers on a solid substrate was investigated. The deposition of the nanoporous silica layers was conducted using C16TAC, deionized water, methanol, and a 27% aqueous ammonia solution. The nanoporous silica layer with the thickness of about 70 nm and with disordered mesostructure formed on a silicon wafer. The mesoporous silica coating was regarded as a way to impart new functions such as molecular sieving on catalysts and adsorbents. The method is a versatile way to prepare mesoporous silica layers on a flat substrate and to coat particles due to the very simple procedure, mild reaction conditions, and reproducible results.

Original languageEnglish
Pages (from-to)1715-1718
Number of pages4
JournalChemistry of Materials
Volume18
Issue number7
DOIs
Publication statusPublished - 2006 Apr 4

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Silicon Dioxide
Silica
Deionized water
Substrates
Silicon wafers
Ammonia
Adsorbents
Methanol
Coatings
Catalysts

ASJC Scopus subject areas

  • Materials Chemistry
  • Materials Science(all)

Cite this

Deposition of thin nanoporous silica layers on solid surfaces. / Ogawa, Makoto; Shimura, Naoki; Ayral, André.

In: Chemistry of Materials, Vol. 18, No. 7, 04.04.2006, p. 1715-1718.

Research output: Contribution to journalArticle

Ogawa, Makoto ; Shimura, Naoki ; Ayral, André. / Deposition of thin nanoporous silica layers on solid surfaces. In: Chemistry of Materials. 2006 ; Vol. 18, No. 7. pp. 1715-1718.
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