Deposition of wide-area diamond films in magneto-microwave plasma

Akio Hiraki, Hiroshi Kawarada, King Sheng Mar, Yoshihiro Yokota, Jin Wei, Jun ichi Suzuki

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Wide-area chemical vapour deposition (CVD) of diamond films has become feasible using magneto-microwave plasma in CH4/H2 or CO/H2 mixtures. The important point of the developed system is to set the electron cyclotron resonance (ECR) condition (875 G in the case of a 2.45 GHz microwave) at the deposition area. The high plasma density necessary for diamond formation can be obtained at the area. Under a pressure of 10 Torr, where complete electron gyrations cannot be expected, the size of the discharge area controlled by the magnetic field is 70-80 mm in diameter. High quality diamond films have been obtained with this pressure. Under a pressure of 0.1 Torr, where ample gyrations occur, the plasma density has been increased by the effective microwave absorption in a magnetic field higher than the ECR condition, i.e. in the so-called off-resonance mode. The plasma is quite uniform and the discharge area is all over the reactor, the size of which is 160 mm in diameter. Uniform diamond films with high quality have been obtained. In the low pressure diamond has been formed on positively, but not on negatively biased substrates. Accelerated ions are not suitable for diamond formation. The CVD of diamond from CO gas and at lower pressure than ever reported shows a different aspect of the mechanism of diamond formation. Atomic carbon or a radical having a simple form, containing one carbon atom, might be a candidate for the active species to form diamond from the vapour phase.

Original languageEnglish
Pages (from-to)799-806
Number of pages8
JournalNuclear Inst. and Methods in Physics Research, B
Volume37-38
Issue numberC
DOIs
Publication statusPublished - 1989 Feb 2
Externally publishedYes

Fingerprint

Diamond
Diamond films
diamond films
Diamonds
diamonds
Microwaves
Plasmas
microwaves
Electron cyclotron resonance
Plasma density
gyration
Carbon Monoxide
electron cyclotron resonance
plasma density
Chemical vapor deposition
Carbon
low pressure
vapor deposition
Magnetic fields
microwave absorption

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

Cite this

Deposition of wide-area diamond films in magneto-microwave plasma. / Hiraki, Akio; Kawarada, Hiroshi; Mar, King Sheng; Yokota, Yoshihiro; Wei, Jin; Suzuki, Jun ichi.

In: Nuclear Inst. and Methods in Physics Research, B, Vol. 37-38, No. C, 02.02.1989, p. 799-806.

Research output: Contribution to journalArticle

Hiraki, Akio ; Kawarada, Hiroshi ; Mar, King Sheng ; Yokota, Yoshihiro ; Wei, Jin ; Suzuki, Jun ichi. / Deposition of wide-area diamond films in magneto-microwave plasma. In: Nuclear Inst. and Methods in Physics Research, B. 1989 ; Vol. 37-38, No. C. pp. 799-806.
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