Deposition techniques of c-axis-tilted ScAlN films by conventional RF magnetron sputtering

Kazuki Arakawa, Takahiko Yanagitani, Kazuhiko Kano, Akihiko Teshigahara, Morito Akiyama

Research output: Chapter in Book/Report/Conference proceedingConference contribution

17 Citations (Scopus)

Abstract

It is difficult to synthesize c-axis tilted ScAlN films by using co-sputtering because unidirectional oblique incident of sputtered particles is needed to obtain c-axis tilted structure. To realize the oblique incident single source sputtering technique was proposed for c-axis tilted film deposition. ScAl alloy target was used to achieve ScAlN film synthesis instead of co-sputtering. As a result c-axis highly tilted ScAlN film (tilt angle 33) was obtained by using this deposition technique. From the result of film transducer loss measurement we found that longitudinal and shear elasticity of AlN decreases by adding Sc. c-axis highly tilted ScAlN film showed giant k 15' values of 0.32 in spite of its low degree of orientation.

Original languageEnglish
Title of host publication2010 IEEE International Ultrasonics Symposium, IUS 2010
Pages1050-1053
Number of pages4
DOIs
Publication statusPublished - 2010 Dec 1
Externally publishedYes
Event2010 IEEE International Ultrasonics Symposium, IUS 2010 - San Diego, CA, United States
Duration: 2010 Oct 112010 Oct 14

Publication series

NameProceedings - IEEE Ultrasonics Symposium
ISSN (Print)1051-0117

Other

Other2010 IEEE International Ultrasonics Symposium, IUS 2010
CountryUnited States
CitySan Diego, CA
Period10/10/1110/10/14

Keywords

  • RF magnetron sputtering
  • ScAl alloy target
  • ScAlN films
  • c axis tilted films

ASJC Scopus subject areas

  • Acoustics and Ultrasonics

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  • Cite this

    Arakawa, K., Yanagitani, T., Kano, K., Teshigahara, A., & Akiyama, M. (2010). Deposition techniques of c-axis-tilted ScAlN films by conventional RF magnetron sputtering. In 2010 IEEE International Ultrasonics Symposium, IUS 2010 (pp. 1050-1053). [5935747] (Proceedings - IEEE Ultrasonics Symposium). https://doi.org/10.1109/ULTSYM.2010.5935747