Design of element blocks for photoresponsive organosiloxane-based materials

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

In this chapter, preparation, structures, and photoresponsive properties of various azobenzene-siloxane hybrid nanomaterials based on the design of element blocks are described. Hydrolysis and polycondensation reactions accompanied by self-assembly of different types of azobenzene-functionalized alkoxysilane precursors yield hybrids with ordered mesostructures. Lamellar films show reversible dspacing changes and macroscopic bending-unbending motion by partial trans-cis photoisomerization of the azobenzene groups. Further, incorporation of a cage oligosiloxane into the precursor leads to the formation of cylindrical assemblies, in which efficient photoisomerization of azobenzene is achieved. These findings will contribute to the creation of novel photoresponsive materials.

Original languageEnglish
Title of host publicationNew Polymeric Materials Based on Element-Blocks
PublisherSpringer Singapore
Pages243-252
Number of pages10
ISBN (Electronic)9789811328893
ISBN (Print)9789811328886
DOIs
Publication statusPublished - 2018 Jan 1

Fingerprint

Azobenzene
Photoisomerization
Siloxanes
Polycondensation
Nanostructured materials
Self assembly
Hydrolysis
azobenzene

Keywords

  • Azobenzene
  • Photoresponsive materials
  • Self-assembly
  • Siloxane
  • Sol-gel processing

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)
  • Chemistry(all)

Cite this

Guo, S., Kuroda, K., & Shimojima, A. (2018). Design of element blocks for photoresponsive organosiloxane-based materials. In New Polymeric Materials Based on Element-Blocks (pp. 243-252). Springer Singapore. https://doi.org/10.1007/978-981-13-2889-3_14

Design of element blocks for photoresponsive organosiloxane-based materials. / Guo, Sufang; Kuroda, Kazuyuki; Shimojima, Atsushi.

New Polymeric Materials Based on Element-Blocks. Springer Singapore, 2018. p. 243-252.

Research output: Chapter in Book/Report/Conference proceedingChapter

Guo, S, Kuroda, K & Shimojima, A 2018, Design of element blocks for photoresponsive organosiloxane-based materials. in New Polymeric Materials Based on Element-Blocks. Springer Singapore, pp. 243-252. https://doi.org/10.1007/978-981-13-2889-3_14
Guo S, Kuroda K, Shimojima A. Design of element blocks for photoresponsive organosiloxane-based materials. In New Polymeric Materials Based on Element-Blocks. Springer Singapore. 2018. p. 243-252 https://doi.org/10.1007/978-981-13-2889-3_14
Guo, Sufang ; Kuroda, Kazuyuki ; Shimojima, Atsushi. / Design of element blocks for photoresponsive organosiloxane-based materials. New Polymeric Materials Based on Element-Blocks. Springer Singapore, 2018. pp. 243-252
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