Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process

Shingo Ichimura, Hidehiko Nonaka, Yoshiki Morikawa, Tsuyoshi Noyori, Tetsuya Nishiguchi, Mitsuru Kekura

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

An ozone generator meant for continuously supplying highly concentrated (HC) ozone gas for low-temprature oxidation process was presented. The generator comprised of four ozone vessels and could supply a constant flow of HC ozone by four modes of operations, such as accumulation, vaporization, evacuation and cooling to each of the ozone vessels. The maximum flow rate for a continuous supply of ozone gas was 60 sccm with a flux stability of ± 1.1%. It was shown that ozone concentration of over 99.5 % could be achieved by the ozone generators.

Original languageEnglish
Pages (from-to)1410-1414
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume22
Issue number4
DOIs
Publication statusPublished - 2004 Jul 1
Externally publishedYes

Fingerprint

Ozone
ozone
Gases
Oxidation
oxidation
gases
Temperature
generators
vessels
supplying
Vaporization
flow velocity
Flow rate
Fluxes
Cooling
cooling

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process. / Ichimura, Shingo; Nonaka, Hidehiko; Morikawa, Yoshiki; Noyori, Tsuyoshi; Nishiguchi, Tetsuya; Kekura, Mitsuru.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 22, No. 4, 01.07.2004, p. 1410-1414.

Research output: Contribution to journalArticle

Ichimura, Shingo ; Nonaka, Hidehiko ; Morikawa, Yoshiki ; Noyori, Tsuyoshi ; Nishiguchi, Tetsuya ; Kekura, Mitsuru. / Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2004 ; Vol. 22, No. 4. pp. 1410-1414.
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