Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process

Shingo Ichimura, Hidehiko Nonaka, Yoshiki Morikawa, Tsuyoshi Noyori, Tetsuya Nishiguchi, Mitsuru Kekura

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

An ozone generator meant for continuously supplying highly concentrated (HC) ozone gas for low-temprature oxidation process was presented. The generator comprised of four ozone vessels and could supply a constant flow of HC ozone by four modes of operations, such as accumulation, vaporization, evacuation and cooling to each of the ozone vessels. The maximum flow rate for a continuous supply of ozone gas was 60 sccm with a flux stability of ± 1.1%. It was shown that ozone concentration of over 99.5 % could be achieved by the ozone generators.

Original languageEnglish
Pages (from-to)1410-1414
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume22
Issue number4
DOIs
Publication statusPublished - 2004 Jul 1
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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