Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process

Shingo Ichimura; Hidehiko Nonaka; Yoshiki Morikawa; Tsuyoshi Noyori; Tetsuya Nishiguchi; Mitsuru Kekura

doi:10.1116/1.1705592

Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process

Shingo Ichimura^*, Hidehiko Nonaka, Yoshiki Morikawa, Tsuyoshi Noyori, Tetsuya Nishiguchi, Mitsuru Kekura

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

23 Citations (Scopus)

Abstract

An ozone generator meant for continuously supplying highly concentrated (HC) ozone gas for low-temprature oxidation process was presented. The generator comprised of four ozone vessels and could supply a constant flow of HC ozone by four modes of operations, such as accumulation, vaporization, evacuation and cooling to each of the ozone vessels. The maximum flow rate for a continuous supply of ozone gas was 60 sccm with a flux stability of ± 1.1%. It was shown that ozone concentration of over 99.5 % could be achieved by the ozone generators.

Original language	English
Pages (from-to)	1410-1414
Number of pages	5
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	22
Issue number	4
DOIs	https://doi.org/10.1116/1.1705592
Publication status	Published - 2004 Jul
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.1705592

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Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process. / Ichimura, Shingo; Nonaka, Hidehiko; Morikawa, Yoshiki et al.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 22, No. 4, 07.2004, p. 1410-1414.

Research output: Contribution to journal › Article › peer-review

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AU - Nishiguchi, Tetsuya

AU - Kekura, Mitsuru

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Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process

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