Development of a Sub-micron Processing Method with Ion Implantation

Seung Jun Yu, Keita Kawabe, Hideaki Ohkubo, Yoshimichi Ohki, Makoto Fujimaki, Makoto Fujimaki, Masaharu Hattori, Mikiko Saito, Yasuo Wada

Research output: Contribution to journalArticle

Abstract

We have developed a precise sub-µm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 µm and a period of 1.59 µm on a 2-µm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.

Original languageEnglish
Pages (from-to)69-70
Number of pages2
JournalIEEJ Transactions on Fundamentals and Materials
Volume125
Issue number1
DOIs
Publication statusPublished - 2005

Fingerprint

Ion implantation
Masks
Bragg gratings
Fused silica
Optical communication
Processing
Plating
Gold
Membranes
Fabrication

Keywords

  • Bragg grating
  • electroplating
  • ion implantation
  • nano-plating
  • sub-µm processing

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Development of a Sub-micron Processing Method with Ion Implantation. / Yu, Seung Jun; Kawabe, Keita; Ohkubo, Hideaki; Ohki, Yoshimichi; Fujimaki, Makoto; Fujimaki, Makoto; Hattori, Masaharu; Saito, Mikiko; Wada, Yasuo.

In: IEEJ Transactions on Fundamentals and Materials, Vol. 125, No. 1, 2005, p. 69-70.

Research output: Contribution to journalArticle

Yu, SJ, Kawabe, K, Ohkubo, H, Ohki, Y, Fujimaki, M, Fujimaki, M, Hattori, M, Saito, M & Wada, Y 2005, 'Development of a Sub-micron Processing Method with Ion Implantation', IEEJ Transactions on Fundamentals and Materials, vol. 125, no. 1, pp. 69-70. https://doi.org/10.1541/ieejfms.125.69
Yu, Seung Jun ; Kawabe, Keita ; Ohkubo, Hideaki ; Ohki, Yoshimichi ; Fujimaki, Makoto ; Fujimaki, Makoto ; Hattori, Masaharu ; Saito, Mikiko ; Wada, Yasuo. / Development of a Sub-micron Processing Method with Ion Implantation. In: IEEJ Transactions on Fundamentals and Materials. 2005 ; Vol. 125, No. 1. pp. 69-70.
@article{d1095d87fc4c43ba8d9ccc1fd7383807,
title = "Development of a Sub-micron Processing Method with Ion Implantation",
abstract = "We have developed a precise sub-µm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 µm and a period of 1.59 µm on a 2-µm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.",
keywords = "Bragg grating, electroplating, ion implantation, nano-plating, sub-µm processing",
author = "Yu, {Seung Jun} and Keita Kawabe and Hideaki Ohkubo and Yoshimichi Ohki and Makoto Fujimaki and Makoto Fujimaki and Masaharu Hattori and Mikiko Saito and Yasuo Wada",
year = "2005",
doi = "10.1541/ieejfms.125.69",
language = "English",
volume = "125",
pages = "69--70",
journal = "IEEJ Transactions on Fundamentals and Materials",
issn = "0385-4205",
publisher = "The Institute of Electrical Engineers of Japan",
number = "1",

}

TY - JOUR

T1 - Development of a Sub-micron Processing Method with Ion Implantation

AU - Yu, Seung Jun

AU - Kawabe, Keita

AU - Ohkubo, Hideaki

AU - Ohki, Yoshimichi

AU - Fujimaki, Makoto

AU - Fujimaki, Makoto

AU - Hattori, Masaharu

AU - Saito, Mikiko

AU - Wada, Yasuo

PY - 2005

Y1 - 2005

N2 - We have developed a precise sub-µm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 µm and a period of 1.59 µm on a 2-µm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.

AB - We have developed a precise sub-µm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 µm and a period of 1.59 µm on a 2-µm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.

KW - Bragg grating

KW - electroplating

KW - ion implantation

KW - nano-plating

KW - sub-µm processing

UR - http://www.scopus.com/inward/record.url?scp=85009630422&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85009630422&partnerID=8YFLogxK

U2 - 10.1541/ieejfms.125.69

DO - 10.1541/ieejfms.125.69

M3 - Article

AN - SCOPUS:85009630422

VL - 125

SP - 69

EP - 70

JO - IEEJ Transactions on Fundamentals and Materials

JF - IEEJ Transactions on Fundamentals and Materials

SN - 0385-4205

IS - 1

ER -