Development of compact cluster ion sources using metal cluster complexes

Ionization properties of metal cluster complexes

T. Mizota, H. Nonaka, T. Fujimoto, A. Kurokawa, Shingo Ichimura

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

In order to develop a new compact cluster ion source as a low damage sputtering source for SIMS to analyze ultra-shallow dopant state we have studied the possibility of using a metal cluster complex as an ion beam source. Metal cluster complexes such as Os3(CO)12 and Ir 4(CO)12 have been studied from the view point of their stability in high vacuum and how to ionize them by using the electron ionization QMS and the XeCl laser ionization TOF. In the case of electron ionization QMS, peaks of Os3(CO)n+ (n=0-12) and Ir 4(CO)n+ (n=0-12) were observed without the fragment ions such as a monomer, a dimer, etc. In the case of laser ionization TOF, peaks of the fragment and the parent ions without a carbonyl ligand were observed from Os3(CO)12, and Ir4(CO) 12. The temperature dependence of fragmentation has also been discussed.

Original languageEnglish
Pages (from-to)945-948
Number of pages4
JournalApplied Surface Science
Volume231-232
DOIs
Publication statusPublished - 2004 Jun 15
Externally publishedYes

Fingerprint

Ion sources
Carbon Monoxide
Ionization
Metals
Electrons
Lasers
Ions
Secondary ion mass spectrometry
Dimers
Ion beams
Sputtering
Monomers
Ligands
Doping (additives)
Vacuum
Temperature

Keywords

  • Cluster ion source
  • Metal cluster complex
  • QMS
  • TOF

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Development of compact cluster ion sources using metal cluster complexes : Ionization properties of metal cluster complexes. / Mizota, T.; Nonaka, H.; Fujimoto, T.; Kurokawa, A.; Ichimura, Shingo.

In: Applied Surface Science, Vol. 231-232, 15.06.2004, p. 945-948.

Research output: Contribution to journalArticle

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