Development of high purity one ATM ozone source - Its application to ultratuin SiO2 film formation on Si substrate

Kunihiko Koike*, Goichi Inoue, Shingo Ichimura, Ken Nakamura, Akira Kurokawa, Hidehiko Nonaka

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

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Chemical Compounds