Diamond deposition on a large-area substrate by plasma-assisted chemical vapor deposition using an antenna-type coaxial microwave plasma generator

Norikazu Taniyama, Minoru Kudo, Osamu Matsumoto, Hiroshi Kawarada

    Research output: Contribution to journalArticle

    21 Citations (Scopus)

    Abstract

    Diamond deposition on a large area silicon wafer substrate (ø100 mm) is achieved with a methane/hydrogen plasma induced by an antenna-type coaxial microwave plasma generator. Deposition of diamond is observed over the entire substrate. Diamond precursors are emitted radially onto a silicon substrate from the plasma sphere generated at the tip of the antenna. The possibility of diamond deposition outside the plasma sphere is discussed using a semi-empirical equation.

    Original languageEnglish
    JournalJapanese Journal of Applied Physics, Part 2: Letters
    Volume40
    Issue number7 A
    Publication statusPublished - 2001 Jul 1

    Fingerprint

    plasma generators
    Chemical vapor deposition
    Diamonds
    antennas
    diamonds
    Microwaves
    vapor deposition
    Antennas
    Plasmas
    microwaves
    Substrates
    semiempirical equations
    hydrogen plasma
    silicon
    Silicon wafers
    Methane
    methane
    wafers
    Silicon
    Hydrogen

    Keywords

    • ACMPG
    • Coaxial cable
    • CVD
    • Deposition
    • Diamond
    • Electrode
    • Heated substrate
    • Large area
    • Microwave
    • Plasma

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

    Cite this

    @article{91cb557623e242d894c61b91d71b31be,
    title = "Diamond deposition on a large-area substrate by plasma-assisted chemical vapor deposition using an antenna-type coaxial microwave plasma generator",
    abstract = "Diamond deposition on a large area silicon wafer substrate ({\o}100 mm) is achieved with a methane/hydrogen plasma induced by an antenna-type coaxial microwave plasma generator. Deposition of diamond is observed over the entire substrate. Diamond precursors are emitted radially onto a silicon substrate from the plasma sphere generated at the tip of the antenna. The possibility of diamond deposition outside the plasma sphere is discussed using a semi-empirical equation.",
    keywords = "ACMPG, Coaxial cable, CVD, Deposition, Diamond, Electrode, Heated substrate, Large area, Microwave, Plasma",
    author = "Norikazu Taniyama and Minoru Kudo and Osamu Matsumoto and Hiroshi Kawarada",
    year = "2001",
    month = "7",
    day = "1",
    language = "English",
    volume = "40",
    journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
    issn = "0021-4922",
    publisher = "Japan Society of Applied Physics",
    number = "7 A",

    }

    TY - JOUR

    T1 - Diamond deposition on a large-area substrate by plasma-assisted chemical vapor deposition using an antenna-type coaxial microwave plasma generator

    AU - Taniyama, Norikazu

    AU - Kudo, Minoru

    AU - Matsumoto, Osamu

    AU - Kawarada, Hiroshi

    PY - 2001/7/1

    Y1 - 2001/7/1

    N2 - Diamond deposition on a large area silicon wafer substrate (ø100 mm) is achieved with a methane/hydrogen plasma induced by an antenna-type coaxial microwave plasma generator. Deposition of diamond is observed over the entire substrate. Diamond precursors are emitted radially onto a silicon substrate from the plasma sphere generated at the tip of the antenna. The possibility of diamond deposition outside the plasma sphere is discussed using a semi-empirical equation.

    AB - Diamond deposition on a large area silicon wafer substrate (ø100 mm) is achieved with a methane/hydrogen plasma induced by an antenna-type coaxial microwave plasma generator. Deposition of diamond is observed over the entire substrate. Diamond precursors are emitted radially onto a silicon substrate from the plasma sphere generated at the tip of the antenna. The possibility of diamond deposition outside the plasma sphere is discussed using a semi-empirical equation.

    KW - ACMPG

    KW - Coaxial cable

    KW - CVD

    KW - Deposition

    KW - Diamond

    KW - Electrode

    KW - Heated substrate

    KW - Large area

    KW - Microwave

    KW - Plasma

    UR - http://www.scopus.com/inward/record.url?scp=0035389211&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=0035389211&partnerID=8YFLogxK

    M3 - Article

    AN - SCOPUS:0035389211

    VL - 40

    JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

    JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

    SN - 0021-4922

    IS - 7 A

    ER -