Diamond deposition on a large-area substrate by plasma-assisted chemical vapor deposition using an antenna-type coaxial microwave plasma generator

Norikazu Taniyama, Minoru Kudo, Osamu Matsumoto, Hiroshi Kawarada

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)

Abstract

Diamond deposition on a large area silicon wafer substrate (ø100 mm) is achieved with a methane/hydrogen plasma induced by an antenna-type coaxial microwave plasma generator. Deposition of diamond is observed over the entire substrate. Diamond precursors are emitted radially onto a silicon substrate from the plasma sphere generated at the tip of the antenna. The possibility of diamond deposition outside the plasma sphere is discussed using a semi-empirical equation.

Original languageEnglish
Pages (from-to)L698-L700
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume40
Issue number7 A
Publication statusPublished - 2001 Jul 1

Keywords

  • ACMPG
  • CVD
  • Coaxial cable
  • Deposition
  • Diamond
  • Electrode
  • Heated substrate
  • Large area
  • Microwave
  • Plasma

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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