Dielectric properties of plasma-polymerized tetrafluoroethylene films

Toshiki Nakano, Masao Fukuyama, Yoshimichi Ohki

    Research output: Contribution to journalArticle

    4 Citations (Scopus)

    Abstract

    A plasma-polymerized tetrafluoroethylene film has dielectric loss peaks below -50°C and approximately at 40°C. The effects of the substrate temperature during polymerization and of plasma irradiation after polymerization on the appearance of the peaks were studied. the low-temperature peak seems to be due to local-mode relaxation of polar groups, while the high-temperature peak seems to be due to phase transition.

    Original languageEnglish
    Pages (from-to)1042-1046
    Number of pages5
    JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    Volume27 pt 1
    Issue number6
    Publication statusPublished - 1988 Jun

    Fingerprint

    Dielectric properties
    dielectric properties
    Plasmas
    Polymerization
    polymerization
    Dielectric losses
    Temperature
    Phase transitions
    dielectric loss
    Irradiation
    Substrates
    irradiation
    temperature

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

    Cite this

    Dielectric properties of plasma-polymerized tetrafluoroethylene films. / Nakano, Toshiki; Fukuyama, Masao; Ohki, Yoshimichi.

    In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 27 pt 1, No. 6, 06.1988, p. 1042-1046.

    Research output: Contribution to journalArticle

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    abstract = "A plasma-polymerized tetrafluoroethylene film has dielectric loss peaks below -50°C and approximately at 40°C. The effects of the substrate temperature during polymerization and of plasma irradiation after polymerization on the appearance of the peaks were studied. the low-temperature peak seems to be due to local-mode relaxation of polar groups, while the high-temperature peak seems to be due to phase transition.",
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    AU - Ohki, Yoshimichi

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