DIFFRACTION EFFECTS ON PATTERN REPLICATION WITH SYNCHROTRON RADIATION.

N. Atoda; H. Kawakatsu; H. Tanino; S. Ichimura; M. Hirata; K. Hoh

doi:10.1116/1.582766

DIFFRACTION EFFECTS ON PATTERN REPLICATION WITH SYNCHROTRON RADIATION.

N. Atoda^*, H. Kawakatsu, H. Tanino, S. Ichimura, M. Hirata, K. Hoh

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

18 Citations (Scopus)

Abstract

With synchrotron radiation from the storage ring ETL-TERAS, the influence of Fresnel diffraction on replicated patterns was investigated. Spatial intensity distributions due to the diffraction were calculated with Fresnel integrals and compared with replicated patterns. Pattern degradation due to the diffraction depends on a parameter U//0 equals W/(G//p lambda /2)** one-half , where W is the pattern width, G//p the mask-to-wafer distance, and lambda the wavelength. From the calculation and the experiments it is concluded that the value of U//0 is needed to be larger than about three for a satisfactory pattern replication. Work with an experimental stencil mask with patterns of submicron dimensions is also described briefly.

Original language	English
Pages (from-to)	1267-1270
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	1
Issue number	4
DOIs	https://doi.org/10.1116/1.582766
Publication status	Published - 1983 Jan 1
Externally published	Yes
Event	Proc of the Int Symp on Electron, Ion, and Photon Beams - Los Angeles, CA, USA Duration: 1983 May 31 → 1983 Jun 3

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.582766

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title = "DIFFRACTION EFFECTS ON PATTERN REPLICATION WITH SYNCHROTRON RADIATION.",

abstract = "With synchrotron radiation from the storage ring ETL-TERAS, the influence of Fresnel diffraction on replicated patterns was investigated. Spatial intensity distributions due to the diffraction were calculated with Fresnel integrals and compared with replicated patterns. Pattern degradation due to the diffraction depends on a parameter U//0 equals W/(G//p lambda /2)** one-half , where W is the pattern width, G//p the mask-to-wafer distance, and lambda the wavelength. From the calculation and the experiments it is concluded that the value of U//0 is needed to be larger than about three for a satisfactory pattern replication. Work with an experimental stencil mask with patterns of submicron dimensions is also described briefly.",

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T1 - DIFFRACTION EFFECTS ON PATTERN REPLICATION WITH SYNCHROTRON RADIATION.

AU - Atoda, N.

AU - Kawakatsu, H.

AU - Tanino, H.

AU - Ichimura, S.

AU - Hirata, M.

AU - Hoh, K.

PY - 1983/1/1

Y1 - 1983/1/1

N2 - With synchrotron radiation from the storage ring ETL-TERAS, the influence of Fresnel diffraction on replicated patterns was investigated. Spatial intensity distributions due to the diffraction were calculated with Fresnel integrals and compared with replicated patterns. Pattern degradation due to the diffraction depends on a parameter U//0 equals W/(G//p lambda /2)** one-half , where W is the pattern width, G//p the mask-to-wafer distance, and lambda the wavelength. From the calculation and the experiments it is concluded that the value of U//0 is needed to be larger than about three for a satisfactory pattern replication. Work with an experimental stencil mask with patterns of submicron dimensions is also described briefly.

AB - With synchrotron radiation from the storage ring ETL-TERAS, the influence of Fresnel diffraction on replicated patterns was investigated. Spatial intensity distributions due to the diffraction were calculated with Fresnel integrals and compared with replicated patterns. Pattern degradation due to the diffraction depends on a parameter U//0 equals W/(G//p lambda /2)** one-half , where W is the pattern width, G//p the mask-to-wafer distance, and lambda the wavelength. From the calculation and the experiments it is concluded that the value of U//0 is needed to be larger than about three for a satisfactory pattern replication. Work with an experimental stencil mask with patterns of submicron dimensions is also described briefly.

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DIFFRACTION EFFECTS ON PATTERN REPLICATION WITH SYNCHROTRON RADIATION.

Abstract

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