TY - GEN
T1 - Direct diagnostic technique of high-intensity laser profile based on laser-compton scattering
AU - Yoshida, Y.
AU - Sato, R.
AU - Sakaue, K.
AU - Endo, A.
AU - Washio, M.
PY - 2013
Y1 - 2013
N2 - A high-intensity laser is essential for plasma generation for EUV (Extreme Ultraviolet) lithography, which is studied as the next generation of ultra-fine semiconductor lithography. Nevertheless, there is no way to directly measure profile of high-intensity laser at the present day. Therefore, we have been developing a method for measuring high-intensity laser profile based on the laser- Compton scattering using Cs-Te photo cathode RF-Gun at Waseda University. Specifically, laser profile is obtained by scanning the electron beam which is focused to about 10 μm by solenoid lens. We have simulated beam size focused by solenoid lens using tracking code GPT (General Particle Tracer) and optimized the beam parameter to obtain beam size of 10 μm. Then, we have installed solenoid lens and generated focused beam. We measured beam size using radiochromic film called GAFCHROMIC dosimetry film type HD-810. In this conference, we will report the result of GPT simulations, beam size measurements, the present progress and future prospects.
AB - A high-intensity laser is essential for plasma generation for EUV (Extreme Ultraviolet) lithography, which is studied as the next generation of ultra-fine semiconductor lithography. Nevertheless, there is no way to directly measure profile of high-intensity laser at the present day. Therefore, we have been developing a method for measuring high-intensity laser profile based on the laser- Compton scattering using Cs-Te photo cathode RF-Gun at Waseda University. Specifically, laser profile is obtained by scanning the electron beam which is focused to about 10 μm by solenoid lens. We have simulated beam size focused by solenoid lens using tracking code GPT (General Particle Tracer) and optimized the beam parameter to obtain beam size of 10 μm. Then, we have installed solenoid lens and generated focused beam. We measured beam size using radiochromic film called GAFCHROMIC dosimetry film type HD-810. In this conference, we will report the result of GPT simulations, beam size measurements, the present progress and future prospects.
UR - http://www.scopus.com/inward/record.url?scp=84890645375&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84890645375&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:84890645375
SN - 9783954501229
T3 - IPAC 2013: Proceedings of the 4th International Particle Accelerator Conference
SP - 3657
EP - 3659
BT - IPAC 2013
T2 - 4th International Particle Accelerator Conference, IPAC 2013
Y2 - 12 May 2013 through 17 May 2013
ER -