Direct measurement of transient drain currents in partially-depleted SOI N-channel MOSFETs using a nuclear microprobe for highly reliable device designs

Toshiaki Iwamatsu, Kouichi Nakayama, Hiromichi Takaoka, Mikio Takai, Yasuo Yamaguchi, Shigeto Maegawa, Masahide Inuishi, Atsushi Kinomura, Yuji Horino, Tadashi Nlshimura

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Transient drain currents caused by proton microprobc irradiations in partially-depleted (PD) silicon-on-insulator (SOI) metal-oxide-semiconductor field-effect transistors (MOSFETs) were analyzed for soft-error issues. Transient currents of the body-tied MOSFETs can be lowered compared to those of the floating body SOI MOSFETs by suppression of the floating body effect. The effectiveness of the body-tie structure was analyzed by device simulation. Increase in the body potential by proton irradiation is suppressed efficiently in the narrow-channel body-tied SOI MOSFETs due to the low body resistance to excess carrier extraction. On the other hand, the body potential of narrow-channel floating body SOI MOSFETs increase to higher levels than those of the wide-channel MOSFETs due to the lower body capacitance. It is indicated that narrow-channel body-tied SOI MOSFETs are suitable for highly reliable devices. Moreover, a more reliable body-tied structure with high impurity concentration in the body regions to reduce the body resistance in the structure is proposed. The collected drain charge was able to be reduced by utilizing this structure. These devices are expected to be applied to highly reliable LSI's used for satellite systems, server and mainstream LSI applications of the multimedia era.

Original languageEnglish
Pages (from-to)2236-2240
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Issue number4 B
Publication statusPublished - 2000 Dec 1



  • Body-tied structure
  • Irradiation
  • Microprobe
  • Proton
  • SOI

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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