Direct photo-etching and surface modification of polytetrafluoroethylene by synchrotron radiation

Toshiyuki Hyuga, Akihiro Oshima, Atsushi Mori, Hiroyuki Nagai, Nozomi Miyoshi, Tatsuya Urakawa, Naoyuki Fukutake, Takanori Katoh, Masakazu Washio

    Research output: Contribution to journalArticle

    8 Citations (Scopus)

    Abstract

    Micromachining of various polytetrafluoroethylene (sintered PTFE, non-sintered PTFE and expand PTFE) using synchrotron radiation (SR) direct photo-etehing has been carried out, and also the etched surface was studied by various analyses. The thin sintered (10μm) and expand (80μm) PTFE films were piled up, and the layered PTFE and non-sintered PTFE (1.2mm) irradiated by SR below the melting temperature, in order to clarify the degree of chemical and physical changes according to the depth from the etched surface. SR irradiated films were examined by 19F solid-state magic-angle spinning (MAS) NMR spectroscopy and differential scanning calorimetric (DSC) analysis. The results showed that the modification by SR irradiation depended on the depth from the surface: within about 60μm from the surface, the network structure formation would be induced even in its solid state; in deeper regions, the chain scission would be dominant. Furthermore, SR was irradiated for non-sintered PTFE with different molecular conformation, compared with usual PTFE. It was found that non-sintered PTFE was also crosslinked in the surface region. Moreover, the sintered and non-sintered PTFE could be etched well. In the case of non-sintered PTFE, the distance of the non-etched remaining structures shrank by heat-treatment at 360°C. The shrinking was about 20%.

    Original languageEnglish
    Pages (from-to)107-111
    Number of pages5
    JournalJournal of Photopolymer Science and Technology
    Volume20
    Issue number1
    DOIs
    Publication statusPublished - 2007

    Fingerprint

    Polytetrafluoroethylene
    Synchrotron radiation
    Polytetrafluoroethylenes
    Surface treatment
    Etching
    Magic angle spinning
    Micromachining
    Nuclear magnetic resonance spectroscopy
    Melting point
    Conformations
    Heat treatment
    Irradiation
    Scanning

    Keywords

    • Direct photo-etching
    • Micro fabrication
    • Polytetrafluoroethylene
    • Surface modification
    • Synchrotron radiation

    ASJC Scopus subject areas

    • Polymers and Plastics
    • Materials Chemistry

    Cite this

    Direct photo-etching and surface modification of polytetrafluoroethylene by synchrotron radiation. / Hyuga, Toshiyuki; Oshima, Akihiro; Mori, Atsushi; Nagai, Hiroyuki; Miyoshi, Nozomi; Urakawa, Tatsuya; Fukutake, Naoyuki; Katoh, Takanori; Washio, Masakazu.

    In: Journal of Photopolymer Science and Technology, Vol. 20, No. 1, 2007, p. 107-111.

    Research output: Contribution to journalArticle

    Hyuga, Toshiyuki ; Oshima, Akihiro ; Mori, Atsushi ; Nagai, Hiroyuki ; Miyoshi, Nozomi ; Urakawa, Tatsuya ; Fukutake, Naoyuki ; Katoh, Takanori ; Washio, Masakazu. / Direct photo-etching and surface modification of polytetrafluoroethylene by synchrotron radiation. In: Journal of Photopolymer Science and Technology. 2007 ; Vol. 20, No. 1. pp. 107-111.
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    AU - Miyoshi, Nozomi

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    AU - Fukutake, Naoyuki

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