DRY LIFTOFF METHOD BY SUBLIMATION OF MOLYBDENUM OXIDE.

Noriyoshi Yamauchi, Toshiaki Yachi, Tsutomu Wada

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

A new liftoff method is proposed in which the film to be lifted-off is deposited on a molybdenum pattern. After the deposition, liftoff is done by thermally oxidizing the molybdenum and sublimating the molybdenum oxide. One micro meter thick sputter-deposited silicon dioxide was successfully delineated by this dry liftoff method. Dry liftoff is possible in an oxygen ambient at a temperature of 700 degree C or higher. The rate at which the molybdenum underneath the silicon dioxide is removed increases with the oxidation temperature and is typically 30 mu m/min at 900 degree C.

Original languageEnglish
Pages (from-to)595-596
Number of pages2
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume22
Issue number9
DOIs
Publication statusPublished - 1983 Jan 1
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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