Duplex Structure and Crystallization of Anodic Alumina Films

O. N.O. Sachiko, Tetsuya Osaka, Noboru Masuko

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Abstract

The structure and the formation behavior of crystalline anodic films formed on aluminum in the mixture of boric acid / ammonium borate solution have been investigated. The film is composed of a boron-containing outer layer and a boron-free inner layer with lens-like crystals being present at the interface. The transport number of A13+ estimated from the thickness ratio of the outer to inner layers is 0.4 when the film is formed at the current density of 20 A-m'2 It increases to 0.45 when the current density is 200 A-m'2. The film thickness decreases with increasing current density. A porous cell structure is developed when the film is formed at a current density higher than 100 A-m"2. Voids in the lens-like crystals are localized in three different regions; i.e., the center top region, the upper interface region between amorphous and crystalline phases, and the lower half region of the crystals.

Original languageEnglish
Pages (from-to)819-824
Number of pages6
JournalDenki Kagaku
Volume64
Issue number7
Publication statusPublished - 1996 Dec 1

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Keywords

  • Anodizing of aluminum
  • Crystal growth
  • Duplex structure
  • TEM

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Sachiko, O. N. O., Osaka, T., & Masuko, N. (1996). Duplex Structure and Crystallization of Anodic Alumina Films. Denki Kagaku, 64(7), 819-824.