Effect of base pressure on the structure and magnetic properties of FePt thin films

Anjana Asthana, Y. K. Takahashi, Yoshio Matsui, K. Hono

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

We have investigated the effect of base pressure of the sputtering chamber on the structure and magnetic properties of the FePt thin films. The A1-FePt thin films deposited at room temperature, at a low base pressure of 5.5×10-7 Torr was ordered to the L10 structure at a low annealing temperature of 200 °C and a highly ordered L10 phase was formed by annealing the film at 300 °C. On the other hand, for the A1-FePt thin films deposited at a higher base pressure of 5.5×10-5 Torr, the ordering to the L10 structure took place at a higher annealing temperature of 400 °C and a fully ordered L10 phase was obtained when the film was annealed at 600 °C. These observations suggest that the low base pressure of the sputtering chamber is effective to reduce the kinetic ordering temperature to a much lower annealing temperature of 200 °C.

Original languageEnglish
Pages (from-to)250-256
Number of pages7
JournalJournal of Magnetism and Magnetic Materials
Volume320
Issue number3-4
DOIs
Publication statusPublished - 2008 Feb
Externally publishedYes

Keywords

  • Base pressure
  • Fe Pt
  • Grain size
  • Microstructure
  • Thin film

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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