Effect of deposition site condition on the initial growth process of electroless CoNiP films

Kunimasa Itakura, Takayuki Homma, Tetsuya Osaka

Research output: Contribution to journalConference article

15 Citations (Scopus)

Abstract

Effect of deposition site condition on the growth process of electroless CoNiP films was investigated by employing the intermediate 'treatment' step during the deposition. The effect of chemical species in the bath on the deposition sites, i.e., the film growth process, was examined using scanning electron microscopy (SEM) and atomic force microscopy (AFM). By changing the pH of the solutions for the 'treatment' step, it was found that the 'treatment' with higher pH solution resulted in the formation of smaller grains which possess lower perpendicular coercivity, Hc(⊥). From these results, ammonia in the deposition bath results in the inhibition of the growth of crystallites, which leads lower Hc(⊥). Based upon this, a model of the growth process of the CoNiP films was proposed.

Original languageEnglish
Pages (from-to)3707-3711
Number of pages5
JournalElectrochimica Acta
Volume44
Issue number21
DOIs
Publication statusPublished - 1999 Jun 1
EventProceedings of the 1999 2nd International Symposium on Electrochemical Microsystems Technologies - Electrochemical Applications of Microtechnology - Grevenbroich, Ger
Duration: 1999 Sep 91999 Sep 11

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Electrochemistry

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