Effect of multiple-step annealing on the formation of semiconducting β-FeSi2 and metallic α-Fe2Si5 on Si (100) by ion beam synthesis

Hiroshi Katsumata, Yunosuke Makita*, Naoto Kobayashi, Hajime Shibata, Masataka Hasegawa, Shin Ichiro Uekusa

*Corresponding author for this work

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