Effect of oxygen content on defect formation in pure-silica core fibers

Kaya Nagasawa, Yutaka Hoshi, Yoshimichi Ohki

Research output: Contribution to journalArticle

34 Citations (Scopus)

Abstract

There is slight lack of stoichiometry in pure silica glass, which varies according to the synthesis process. The lack of stoichiometry leads to defect formations: The 245 nm absorption band and drawing-induced E’ centers are formed in oxygen-deficient silica, but peroxy radicals and drawing-induced 2 eV band are formed in oxygen-rich silica. The 245 nm band seems to be caused by the Si-Si bonding.

Original languageEnglish
Pages (from-to)L554-L557
JournalJapanese journal of applied physics
Volume26
Issue number5A
DOIs
Publication statusPublished - 1987 May

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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