Effect of oxygen content on defect formation in pure-silica core fibers

Kaya Nagasawa, Yutaka Hoshi, Yoshimichi Ohki

Research output: Contribution to journalArticlepeer-review

35 Citations (Scopus)

Abstract

There is slight lack of stoichiometry in pure silica glass, which varies according to the synthesis process. The lack of stoichiometry leads to defect formations: The 245 nm absorption band and drawing-induced E’ centers are formed in oxygen-deficient silica, but peroxy radicals and drawing-induced 2 eV band are formed in oxygen-rich silica. The 245 nm band seems to be caused by the Si-Si bonding.

Original languageEnglish
Pages (from-to)L554-L557
JournalJapanese journal of applied physics
Volume26
Issue number5A
DOIs
Publication statusPublished - 1987 May

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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