Abstract
There is slight lack of stoichiometry in pure silica glass, which varies according to the synthesis process. The lack of stoichiometry leads to defect formations: The 245 nm absorption band and drawing-induced E’ centers are formed in oxygen-deficient silica, but peroxy radicals and drawing-induced 2 eV band are formed in oxygen-rich silica. The 245 nm band seems to be caused by the Si-Si bonding.
| Original language | English |
|---|---|
| Pages (from-to) | L554-L557 |
| Journal | Japanese journal of applied physics |
| Volume | 26 |
| Issue number | 5A |
| DOIs | |
| Publication status | Published - 1987 May |
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)
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Cite this
Nagasawa, K., Hoshi, Y., & Ohki, Y. (1987). Effect of oxygen content on defect formation in pure-silica core fibers. Japanese journal of applied physics, 26(5A), L554-L557. https://doi.org/10.1143/JJAP.26.L554