TY - JOUR
T1 - Effect of oxygen content on defect formation in pure-silica core fibers
AU - Nagasawa, Kaya
AU - Hoshi, Yutaka
AU - Ohki, Yoshimichi
PY - 1987/5
Y1 - 1987/5
N2 - There is slight lack of stoichiometry in pure silica glass, which varies according to the synthesis process. The lack of stoichiometry leads to defect formations: The 245 nm absorption band and drawing-induced E’ centers are formed in oxygen-deficient silica, but peroxy radicals and drawing-induced 2 eV band are formed in oxygen-rich silica. The 245 nm band seems to be caused by the Si-Si bonding.
AB - There is slight lack of stoichiometry in pure silica glass, which varies according to the synthesis process. The lack of stoichiometry leads to defect formations: The 245 nm absorption band and drawing-induced E’ centers are formed in oxygen-deficient silica, but peroxy radicals and drawing-induced 2 eV band are formed in oxygen-rich silica. The 245 nm band seems to be caused by the Si-Si bonding.
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U2 - 10.1143/JJAP.26.L554
DO - 10.1143/JJAP.26.L554
M3 - Article
AN - SCOPUS:0023344386
VL - 26
SP - L554-L557
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 5A
ER -