Effect of polar groups on the electrical breakdown strength of plasma-polymerized films

Toshiki Nakano, Masao Fukuyama, Hisaaki Hayashi, Keisuke Ishii, Yoshimichi Ohki

    Research output: Contribution to journalArticle

    9 Citations (Scopus)

    Abstract

    The electrical breakdown of plasma polymer films was studied by applying rectangular voltage pulses. Experimental evidence indicates that the breakdown field increases after incorporation of fluorine atoms into the film when the pulse width is <5 μs. This is due to the scattering of electronic carriers caused by C-F bonds.

    Original languageEnglish
    Pages (from-to)1085-1091
    Number of pages7
    JournalIEEE Transactions on Electrical Insulation
    Volume25
    Issue number6
    DOIs
    Publication statusPublished - 1990 Dec

    Fingerprint

    Fluorine
    Polymer films
    Scattering
    Plasmas
    Atoms
    Electric potential

    ASJC Scopus subject areas

    • Engineering(all)

    Cite this

    Effect of polar groups on the electrical breakdown strength of plasma-polymerized films. / Nakano, Toshiki; Fukuyama, Masao; Hayashi, Hisaaki; Ishii, Keisuke; Ohki, Yoshimichi.

    In: IEEE Transactions on Electrical Insulation, Vol. 25, No. 6, 12.1990, p. 1085-1091.

    Research output: Contribution to journalArticle

    Nakano, Toshiki ; Fukuyama, Masao ; Hayashi, Hisaaki ; Ishii, Keisuke ; Ohki, Yoshimichi. / Effect of polar groups on the electrical breakdown strength of plasma-polymerized films. In: IEEE Transactions on Electrical Insulation. 1990 ; Vol. 25, No. 6. pp. 1085-1091.
    @article{c9957212a8c44d82b6629cd12487af4f,
    title = "Effect of polar groups on the electrical breakdown strength of plasma-polymerized films",
    abstract = "The electrical breakdown of plasma polymer films was studied by applying rectangular voltage pulses. Experimental evidence indicates that the breakdown field increases after incorporation of fluorine atoms into the film when the pulse width is <5 μs. This is due to the scattering of electronic carriers caused by C-F bonds.",
    author = "Toshiki Nakano and Masao Fukuyama and Hisaaki Hayashi and Keisuke Ishii and Yoshimichi Ohki",
    year = "1990",
    month = "12",
    doi = "10.1109/14.64493",
    language = "English",
    volume = "25",
    pages = "1085--1091",
    journal = "IEEE Transactions on Dielectrics and Electrical Insulation",
    issn = "1070-9878",
    publisher = "Institute of Electrical and Electronics Engineers Inc.",
    number = "6",

    }

    TY - JOUR

    T1 - Effect of polar groups on the electrical breakdown strength of plasma-polymerized films

    AU - Nakano, Toshiki

    AU - Fukuyama, Masao

    AU - Hayashi, Hisaaki

    AU - Ishii, Keisuke

    AU - Ohki, Yoshimichi

    PY - 1990/12

    Y1 - 1990/12

    N2 - The electrical breakdown of plasma polymer films was studied by applying rectangular voltage pulses. Experimental evidence indicates that the breakdown field increases after incorporation of fluorine atoms into the film when the pulse width is <5 μs. This is due to the scattering of electronic carriers caused by C-F bonds.

    AB - The electrical breakdown of plasma polymer films was studied by applying rectangular voltage pulses. Experimental evidence indicates that the breakdown field increases after incorporation of fluorine atoms into the film when the pulse width is <5 μs. This is due to the scattering of electronic carriers caused by C-F bonds.

    UR - http://www.scopus.com/inward/record.url?scp=0025692261&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=0025692261&partnerID=8YFLogxK

    U2 - 10.1109/14.64493

    DO - 10.1109/14.64493

    M3 - Article

    AN - SCOPUS:0025692261

    VL - 25

    SP - 1085

    EP - 1091

    JO - IEEE Transactions on Dielectrics and Electrical Insulation

    JF - IEEE Transactions on Dielectrics and Electrical Insulation

    SN - 1070-9878

    IS - 6

    ER -