Effect of sputtering geometry on (112̄0) textured ZnO piezofilm

Yoshinori Miyamoto, Takahiko Yanagitani, Mami Matsukawa, Yoshiaki Watanabe

Research output: Contribution to journalReview article

5 Citations (Scopus)

Abstract

The effects of sputtering geometry on (112̄0) textured ZnO piezofilm were analyzed. The ZnO film was fabricated using a conventional RF magnetron sputtering apparatus. The crystallite alignment in the substrate normal direction was estimated using the full width half maximum (FWHM) of the ω-scan rocking curve. The results show that crystallites alignment and film thickness are strongly affected by the substrate position, despite that the other sputtering conditions are identical.

Original languageEnglish
Pages (from-to)53-55
Number of pages3
JournalAcoustical Science and Technology
Volume27
Issue number1
DOIs
Publication statusPublished - 2006 Jan 9
Externally publishedYes

Keywords

  • Crystallite alignment
  • Piezoelectric film
  • Sputtering
  • Zinc oxide

ASJC Scopus subject areas

  • Acoustics and Ultrasonics

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