Effect of sputtering geometry on (112̄0) textured ZnO piezofilm

Yoshinori Miyamoto, Takahiko Yanagitani, Mami Matsukawa, Yoshiaki Watanabe

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The effects of sputtering geometry on (112̄0) textured ZnO piezofilm were analyzed. The ZnO film was fabricated using a conventional RF magnetron sputtering apparatus. The crystallite alignment in the substrate normal direction was estimated using the full width half maximum (FWHM) of the ω-scan rocking curve. The results show that crystallites alignment and film thickness are strongly affected by the substrate position, despite that the other sputtering conditions are identical.

Original languageEnglish
Pages (from-to)53-55
Number of pages3
JournalAcoustical Science and Technology
Volume27
Issue number1
DOIs
Publication statusPublished - 2006
Externally publishedYes

Fingerprint

sputtering
alignment
geometry
crystallites
magnetron sputtering
film thickness
curves

Keywords

  • Crystallite alignment
  • Piezoelectric film
  • Sputtering
  • Zinc oxide

ASJC Scopus subject areas

  • Acoustics and Ultrasonics

Cite this

Effect of sputtering geometry on (112̄0) textured ZnO piezofilm. / Miyamoto, Yoshinori; Yanagitani, Takahiko; Matsukawa, Mami; Watanabe, Yoshiaki.

In: Acoustical Science and Technology, Vol. 27, No. 1, 2006, p. 53-55.

Research output: Contribution to journalArticle

Miyamoto, Yoshinori ; Yanagitani, Takahiko ; Matsukawa, Mami ; Watanabe, Yoshiaki. / Effect of sputtering geometry on (112̄0) textured ZnO piezofilm. In: Acoustical Science and Technology. 2006 ; Vol. 27, No. 1. pp. 53-55.
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