Abstract
The effects of sputtering geometry on (112̄0) textured ZnO piezofilm were analyzed. The ZnO film was fabricated using a conventional RF magnetron sputtering apparatus. The crystallite alignment in the substrate normal direction was estimated using the full width half maximum (FWHM) of the ω-scan rocking curve. The results show that crystallites alignment and film thickness are strongly affected by the substrate position, despite that the other sputtering conditions are identical.
Original language | English |
---|---|
Pages (from-to) | 53-55 |
Number of pages | 3 |
Journal | Acoustical Science and Technology |
Volume | 27 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2006 |
Externally published | Yes |
Keywords
- Crystallite alignment
- Piezoelectric film
- Sputtering
- Zinc oxide
ASJC Scopus subject areas
- Acoustics and Ultrasonics