Effect of substrate temperature on crystal orientation and residual stress in radio frequency sputtered gallium-nitride films

Kazuya Kusaka, Takao Hanabusa, Kikuo Tominaga, Noriyoshi Yamauchi

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The effect of substrate temperature on the crystal orientation and residual stresses of gallium-nitride (GaN) films obtained by sputtering was discussed. X-ray diffraction method was used for the study. The GaN films were deposited at various substrate temperatures and the gas pressure and input power were kept constant. The crystal sizes of the films deposited at high temperatures were found to be larger than those obtained at low substrate temperatures. All films except that deposited at 973K exhibited a compressive residual stress which was observed to be decreasing with increase in temperatures.

Original languageEnglish
Pages (from-to)1587-1590
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume22
Issue number4
DOIs
Publication statusPublished - 2004 Jul 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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