Effect of Tl-codeposition on Au electrodeposition from non-cyanide bath

M. Saito, K. Inoue, K. Shiokawa, T. Homma

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Citations (Scopus)

Abstract

Effect of Tl on the electrodeposition behavior of Au was investigated by electrochemical analysis, total-reflection X-ray fluorescene analysis, XRD, glow discharge optical emission spectrometer (GD-OES) and hardness measurement. The deposition rate increased with an increase in the amount of Tl addition to the bath. Tl was co-deposited at the interface between the seed layer and the Au films, as well as in the films. In asdeposited condition, the Tl contained films exhibited higher hardness compared with the Tl-free films, while both of them showed almost the same hardness after annealing. It was suggested that the hardness is correlated with the crystal orientation of the grains.

Original languageEnglish
Title of host publicationFundamentals of Electrochemical Growth
Subtitle of host publicationFrom UPD to Microstructures - Symposium in Memory of Prof. Evgeni Budevski
Pages87-96
Number of pages10
Edition34
DOIs
Publication statusPublished - 2010 Dec 1
EventFundamentals of Electrochemical Growth: From UPD to Microstructures - Symposium in Memory of Prof. Evgeni Budevski - 216th ECS Meeting - Vienna, Austria
Duration: 2009 Oct 42009 Oct 9

Publication series

NameECS Transactions
Number34
Volume25
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

ConferenceFundamentals of Electrochemical Growth: From UPD to Microstructures - Symposium in Memory of Prof. Evgeni Budevski - 216th ECS Meeting
CountryAustria
CityVienna
Period09/10/409/10/9

ASJC Scopus subject areas

  • Engineering(all)

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    Saito, M., Inoue, K., Shiokawa, K., & Homma, T. (2010). Effect of Tl-codeposition on Au electrodeposition from non-cyanide bath. In Fundamentals of Electrochemical Growth: From UPD to Microstructures - Symposium in Memory of Prof. Evgeni Budevski (34 ed., pp. 87-96). (ECS Transactions; Vol. 25, No. 34). https://doi.org/10.1149/1.3335495