Effective control of surface property on poly(silsesquioxane) films by chemical modification

Takashi Hamada, Takashi Nagase, Takashi Kobayashi, Kimihiro Matsukawa, Hiroyoshi Naito*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

We report the strategy of controlling the surface properties of polymethylsilsesquioxane (PMSQ) films by a silane-coupling agent. The surface properties of chemically modified PMSQ films are investigated by the water contact angle and Fourier transform infrared (FTIR) measurements. The FTIR spectra show the distinct change of the silanol peaks before and after octadecyltrichlorosilane (OTS) treatments of PMSQ films. The OTS-modified PMSQ films exhibit a high water contact angle of 100°, which is much higher than that of non-treated PMSQ films (89°). The electrical performances of organic thin-film transistors are enhanced by the surface modification of PMSQ films using OTS as the silane-coupling agent.

Original languageEnglish
Pages (from-to)1335-1339
Number of pages5
JournalThin Solid Films
Volume517
Issue number4
DOIs
Publication statusPublished - 2008 Dec 31
Externally publishedYes

Keywords

  • Chemical modification
  • Organic thin-film transistor
  • Polysilsesquioxane
  • Surface property

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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