Effects of fluorine addition on the structure and optical properties of SiO2 films formed by plasma-enhanced chemical vapor deposition

K. Ishii, A. Takami, Yoshimichi Ohki

    Research output: Contribution to journalArticle

    16 Citations (Scopus)

    Abstract

    In order to elucidate the effects of fluorine addition on the structure and optical properties of SiO2 films formed by plasma-enhanced chemical vapor deposition of tetraethoxysilane. photoluminescence and optical absorption characteristics were studied using synchrotron radiation as an excitation photon source. Luminescence appears at 4.4 eV in both fluorine-doped and nondoped films when excited by 7.6 eV photons, indicating that the oxygen vacancies exist in both films The decay profile of the 4.4 eV luminescence deviates from a single-exponential curve, indicating that the microscopic structure is not uniform in the sample. This deviation becomes smaller by the fluorine addition. Infrared absorption spectra indicate that the width of the distribution of bond angle 〈SiOSi becomes smaller with an increase in the fluorine content. From these results, it is considered that the distribution of the bond angle decreases by the addition of fluorine. The optical gap energy was found to increase with the increase in the fluorine content. Presumably, this is also due to the homogeneous structure with a uniform bond angle caused by the fluorine addition.

    Original languageEnglish
    Pages (from-to)1470-1474
    Number of pages5
    JournalJournal of Applied Physics
    Volume81
    Issue number3
    Publication statusPublished - 1997 Feb 1

    Fingerprint

    fluorine
    vapor deposition
    optical properties
    luminescence
    photons
    infrared absorption
    synchrotron radiation
    optical absorption
    infrared spectra
    absorption spectra
    deviation
    photoluminescence
    decay
    oxygen
    curves
    profiles
    excitation

    ASJC Scopus subject areas

    • Physics and Astronomy(all)
    • Physics and Astronomy (miscellaneous)

    Cite this

    Effects of fluorine addition on the structure and optical properties of SiO2 films formed by plasma-enhanced chemical vapor deposition. / Ishii, K.; Takami, A.; Ohki, Yoshimichi.

    In: Journal of Applied Physics, Vol. 81, No. 3, 01.02.1997, p. 1470-1474.

    Research output: Contribution to journalArticle

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    N2 - In order to elucidate the effects of fluorine addition on the structure and optical properties of SiO2 films formed by plasma-enhanced chemical vapor deposition of tetraethoxysilane. photoluminescence and optical absorption characteristics were studied using synchrotron radiation as an excitation photon source. Luminescence appears at 4.4 eV in both fluorine-doped and nondoped films when excited by 7.6 eV photons, indicating that the oxygen vacancies exist in both films The decay profile of the 4.4 eV luminescence deviates from a single-exponential curve, indicating that the microscopic structure is not uniform in the sample. This deviation becomes smaller by the fluorine addition. Infrared absorption spectra indicate that the width of the distribution of bond angle 〈SiOSi becomes smaller with an increase in the fluorine content. From these results, it is considered that the distribution of the bond angle decreases by the addition of fluorine. The optical gap energy was found to increase with the increase in the fluorine content. Presumably, this is also due to the homogeneous structure with a uniform bond angle caused by the fluorine addition.

    AB - In order to elucidate the effects of fluorine addition on the structure and optical properties of SiO2 films formed by plasma-enhanced chemical vapor deposition of tetraethoxysilane. photoluminescence and optical absorption characteristics were studied using synchrotron radiation as an excitation photon source. Luminescence appears at 4.4 eV in both fluorine-doped and nondoped films when excited by 7.6 eV photons, indicating that the oxygen vacancies exist in both films The decay profile of the 4.4 eV luminescence deviates from a single-exponential curve, indicating that the microscopic structure is not uniform in the sample. This deviation becomes smaller by the fluorine addition. Infrared absorption spectra indicate that the width of the distribution of bond angle 〈SiOSi becomes smaller with an increase in the fluorine content. From these results, it is considered that the distribution of the bond angle decreases by the addition of fluorine. The optical gap energy was found to increase with the increase in the fluorine content. Presumably, this is also due to the homogeneous structure with a uniform bond angle caused by the fluorine addition.

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