Effects of internal postoxidation on the oxygen deficiency and dielectric strength of buried oxide formed by the separation-by-implanted-oxygen (SIMOX) process

Kwang Soo Seol, Hidemi Koike, Tsuyoshi Futami, Yoshimichi Ohki

Research output: Contribution to journalArticle

Abstract

Effects of internal postoxidation on buried silicon dioxide have been studied. The dioxide examined was the buried insulator in a silicon-on-insulator (SOI) structure fabricated by implantation of oxygen ions into Si, or the SIMOX process. Internal postoxidation is an oxidation process applied to the SOI structure after its fabrication. It was observed that the photoluminescence intensity due to neutral oxygen vacancies were also found to increase similarly. The measurements repeatedly done by changing the oxide thickness revealed that the increased part of oxide by the internal oxidation contains the vacancies with a similar density to the original part. It is concluded that the internal oxidation scarcely affects the oxygen deficiency of the oxide. It was also observed that the number of breakdowns at low electric fields remarkably decreased after the internal oxidation, indicating that electrically weak spots such as silicon pipes were effectively reduced.

Original languageEnglish
Pages (from-to)15-20
Number of pages6
JournalElectrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi)
Volume130
Issue number1
DOIs
Publication statusPublished - 2000 Jan 15

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ASJC Scopus subject areas

  • Energy Engineering and Power Technology
  • Electrical and Electronic Engineering

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