Effects of negative oxygen ions generated during Sc ingot sputtering on electromechanical coupling of ScAlN film

Sliinji Takayanagi, Takahiko Yanagitani

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

ScAlN films are well-researched for GHz acoustic wave devices. Large-area growth techniques of ScAlN films are necessary for the practical application. A single sputtering source with a ScAl alloy metal target is suitable for the film growth from the point of view of the composition stability. However, it is difficult to alloy Al with Sc in the large-size target. Therefore, a mosaic target of Sc and Al metals is reasonable for the large-area growth. In previous study, we demonstrated Sc ingot sputtering deposition [1] in which Sc ingots were set on an Al metal target as similar conditions with the mosaic target. Oxidization of Sc ingots was seriously problem in this method because the c-axis orientation of ScAlN films was degraded by bombardment with O-negative ions generated from the target. In this study, we investigated the effects of the negative ion bombardment on the crystalline orientations and piezoelectric properties.

Original languageEnglish
Title of host publication2017 IEEE International Ultrasonics Symposium, IUS 2017
PublisherIEEE Computer Society
ISBN (Electronic)9781538633830
DOIs
Publication statusPublished - 2017 Oct 31
Event2017 IEEE International Ultrasonics Symposium, IUS 2017 - Washington, United States
Duration: 2017 Sep 62017 Sep 9

Publication series

NameIEEE International Ultrasonics Symposium, IUS
ISSN (Print)1948-5719
ISSN (Electronic)1948-5727

Other

Other2017 IEEE International Ultrasonics Symposium, IUS 2017
Country/TerritoryUnited States
CityWashington
Period17/9/617/9/9

ASJC Scopus subject areas

  • Acoustics and Ultrasonics

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