Effects of substrate heating and biasing on nanostructural evolution of nonepitaxially grown TiN nanofilms

T. Q. Li, S. Noda, F. Okada, H. Komiyama

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

The effects of substrate heating and substrate biasing on the initial stage of nonepitaxial heterogeneous growth of TiN on Si(111) was studied using high-resolution transmission electron microscopy. The TiN thin films were deposited using dc reactive magnetron sputtering. It was observed that the higher ion energy causes loosely bound ions on the surface of the grains to be resputtered resulting in a denser film structure. It was shown that the different effects of room temperature and substrate bias voltage on TiN initial growth resulted in different textures at a film thickness of 50 nm.

Original languageEnglish
Pages (from-to)2512-2516
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number6
Publication statusPublished - 2003 Nov 1

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ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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