Electrical characteristics of polymer field-effect transistors with poly(methylsilsesquioxane) gate dielectrics on plastic substrates

Saori Yamazaki, Takashi Hamada, Kenji Tomatsu, Yusuke Ueda, Takashi Nagase, Takashi Kobayashi, Shuichi Murakami, Kimihiro Matsukawa, Hiroyoshi Naito*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

The fabrication of poly(3-hexylthiophene)(P3HT)-based field-effect transistors (FETs) on plastic substrates by solution processes has been systematically investigated. Top-contact P3HT FETs with polycarbonate (PC) substrates are fabricated using organic-inorganic hybrid gate insulators of poly(methylsilsesquioxane) (PMSQ) with a low curing temperature. It is found that the electrical characteristics of fabricated P3HT FETs are significantly influenced by residual oxygen and/or water in PC substrates and the drain current is remarkably increased even in oxygen and water-free environments. The electrical performances of the FETs on PC substrates are recovered by thermal annealing under vacuum and the annealed FETs exhibit stable characteristics, which are comparable to those of the FETs fabricated on glass substrates with PMSQ gate insulators.

Original languageEnglish
Pages (from-to)1343-1345
Number of pages3
JournalThin Solid Films
Volume517
Issue number4
DOIs
Publication statusPublished - 2008 Dec 31
Externally publishedYes

Keywords

  • Gate insulator
  • Organic field-effect transistor
  • Plastic substrate
  • Poly(methylsilsesqioxane)

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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