Electrochemical characterization of nitrogen-incorporated tetrahedral carbon films grown by a filtered cathodic vacuum arc

Nelson C. Yee; Qingfang Shi; Wen Bin Cai; Daniel Alberto Scherson; Barry Miller

doi:10.1149/1.1399877

Electrochemical characterization of nitrogen-incorporated tetrahedral carbon films grown by a filtered cathodic vacuum arc

Nelson C. Yee, Qingfang Shi, Wen Bin Cai, Daniel Alberto Scherson, Barry Miller^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

24 Citations (Scopus)

Abstract

Tetrahedral carbon films incorporating nitrogen (taC:N) have been produced on Si, Ta, Ti, and electrochemically roughened Ag surfaces using a single commercial filtered cathodic vacuum arc (FCVA) carbon ion source in the presence of nitrogen gas at reduced pressure. Highly resolved Raman spectra under visible laser excitation were obtained for taC:N films only a few nanometers thick deposited on roughened Ag, including the rather elusive T band characteristic of sp³ hybridized bonding. The electrochemical response of taC:N supported on polished Ta in aqueous solutions was virtually identical to that reported earlier for taC:N films on Si prepared by the simultaneous incidence of a custom-made FCVA carbon ion source and a nitrogen ion gun. Reversible kinetics for Ru(NH₃)₆Cl₃ reduction in 1 M KCl and electrocatalytic activity for chlorine evolution and reduction in 1 M HCl solutions are observed juxtaposed to high overpotentials for hydrogen and oxygen evolution.

Original language	English
Journal	Electrochemical and Solid-State Letters
Volume	4
Issue number	10
DOIs	https://doi.org/10.1149/1.1399877
Publication status	Published - 2001 Oct 1
Externally published	Yes

ASJC Scopus subject areas

Chemical Engineering(all)
Materials Science(all)
Physical and Theoretical Chemistry
Electrochemistry
Electrical and Electronic Engineering

Access to Document

10.1149/1.1399877

Cite this

@article{2f82be5e1e8346889b65500b38ab0ab8,

title = "Electrochemical characterization of nitrogen-incorporated tetrahedral carbon films grown by a filtered cathodic vacuum arc",

abstract = "Tetrahedral carbon films incorporating nitrogen (taC:N) have been produced on Si, Ta, Ti, and electrochemically roughened Ag surfaces using a single commercial filtered cathodic vacuum arc (FCVA) carbon ion source in the presence of nitrogen gas at reduced pressure. Highly resolved Raman spectra under visible laser excitation were obtained for taC:N films only a few nanometers thick deposited on roughened Ag, including the rather elusive T band characteristic of sp3 hybridized bonding. The electrochemical response of taC:N supported on polished Ta in aqueous solutions was virtually identical to that reported earlier for taC:N films on Si prepared by the simultaneous incidence of a custom-made FCVA carbon ion source and a nitrogen ion gun. Reversible kinetics for Ru(NH3)6Cl3 reduction in 1 M KCl and electrocatalytic activity for chlorine evolution and reduction in 1 M HCl solutions are observed juxtaposed to high overpotentials for hydrogen and oxygen evolution.",

author = "Yee, {Nelson C.} and Qingfang Shi and Cai, {Wen Bin} and Scherson, {Daniel Alberto} and Barry Miller",

year = "2001",

month = oct,

day = "1",

doi = "10.1149/1.1399877",

language = "English",

volume = "4",

journal = "Electrochemical and Solid-State Letters",

issn = "1099-0062",

publisher = "Electrochemical Society, Inc.",

number = "10",

}

TY - JOUR

T1 - Electrochemical characterization of nitrogen-incorporated tetrahedral carbon films grown by a filtered cathodic vacuum arc

AU - Yee, Nelson C.

AU - Shi, Qingfang

AU - Cai, Wen Bin

AU - Scherson, Daniel Alberto

AU - Miller, Barry

PY - 2001/10/1

Y1 - 2001/10/1

N2 - Tetrahedral carbon films incorporating nitrogen (taC:N) have been produced on Si, Ta, Ti, and electrochemically roughened Ag surfaces using a single commercial filtered cathodic vacuum arc (FCVA) carbon ion source in the presence of nitrogen gas at reduced pressure. Highly resolved Raman spectra under visible laser excitation were obtained for taC:N films only a few nanometers thick deposited on roughened Ag, including the rather elusive T band characteristic of sp3 hybridized bonding. The electrochemical response of taC:N supported on polished Ta in aqueous solutions was virtually identical to that reported earlier for taC:N films on Si prepared by the simultaneous incidence of a custom-made FCVA carbon ion source and a nitrogen ion gun. Reversible kinetics for Ru(NH3)6Cl3 reduction in 1 M KCl and electrocatalytic activity for chlorine evolution and reduction in 1 M HCl solutions are observed juxtaposed to high overpotentials for hydrogen and oxygen evolution.

AB - Tetrahedral carbon films incorporating nitrogen (taC:N) have been produced on Si, Ta, Ti, and electrochemically roughened Ag surfaces using a single commercial filtered cathodic vacuum arc (FCVA) carbon ion source in the presence of nitrogen gas at reduced pressure. Highly resolved Raman spectra under visible laser excitation were obtained for taC:N films only a few nanometers thick deposited on roughened Ag, including the rather elusive T band characteristic of sp3 hybridized bonding. The electrochemical response of taC:N supported on polished Ta in aqueous solutions was virtually identical to that reported earlier for taC:N films on Si prepared by the simultaneous incidence of a custom-made FCVA carbon ion source and a nitrogen ion gun. Reversible kinetics for Ru(NH3)6Cl3 reduction in 1 M KCl and electrocatalytic activity for chlorine evolution and reduction in 1 M HCl solutions are observed juxtaposed to high overpotentials for hydrogen and oxygen evolution.

UR - http://www.scopus.com/inward/record.url?scp=0035496854&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035496854&partnerID=8YFLogxK

U2 - 10.1149/1.1399877

DO - 10.1149/1.1399877

M3 - Article

AN - SCOPUS:0035496854

SN - 1099-0062

VL - 4

JO - Electrochemical and Solid-State Letters

JF - Electrochemical and Solid-State Letters

IS - 10

ER -

Electrochemical characterization of nitrogen-incorporated tetrahedral carbon films grown by a filtered cathodic vacuum arc

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this