Abstract
This paper describes the fabrication process of CoPt nandot arrays on a glass disk substrate with a CoZrNb underlayer as a soft magnetic underlayer (SUL) by using an electrochemical process, and also the analysis on the magnetic properties of these fabricated CoPt nanodot arrays. We formed nano-patterned substrates by UV-nanoimprint lithography (UV-NIL) on the glass disk substrate. CoPt was electrodeposited into the nano-patterned substrates optimizing the electrodeposition condition and bath composition as well as a Cu intermediate layer. The construction of the nanodot arrays were CoPt nanodot arrays (20 nm)/Cu (<5 nm)/CoZrNb (100 nm)/Cr (5 nm)/Glass disk. Magnetic signals were clearly observed on the dc magnetized state and multi domain were observed in each nanodot on the ac magnetized state by magnetic force microscopy (MFM). The perpendicular coercivity of the CoPt nanodot arrays was 430 kA/m. These results showed electrochemical process can be used for the manufacture of magnetic recording media.
| Original language | English |
|---|---|
| Article number | 5467574 |
| Pages (from-to) | 2224-2227 |
| Number of pages | 4 |
| Journal | IEEE Transactions on Magnetics |
| Volume | 46 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 2010 Jun |
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Keywords
- Bit patterned media
- CoPt
- Electrodeposition
- Nano-imprint lithography
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
Cite this
Electrochemical fabrication and characterization of CoPt bit patterned media : Towards a wetchemical, large-scale fabrication. / Ouchi, Takanari; Arikawa, Yuki; Kuno, Taisuke; Mizuno, Jun; Shoji, Shuichi; Homma, Takayuki.
In: IEEE Transactions on Magnetics, Vol. 46, No. 6, 5467574, 06.2010, p. 2224-2227.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Electrochemical fabrication and characterization of CoPt bit patterned media
T2 - Towards a wetchemical, large-scale fabrication
AU - Ouchi, Takanari
AU - Arikawa, Yuki
AU - Kuno, Taisuke
AU - Mizuno, Jun
AU - Shoji, Shuichi
AU - Homma, Takayuki
PY - 2010/6
Y1 - 2010/6
N2 - This paper describes the fabrication process of CoPt nandot arrays on a glass disk substrate with a CoZrNb underlayer as a soft magnetic underlayer (SUL) by using an electrochemical process, and also the analysis on the magnetic properties of these fabricated CoPt nanodot arrays. We formed nano-patterned substrates by UV-nanoimprint lithography (UV-NIL) on the glass disk substrate. CoPt was electrodeposited into the nano-patterned substrates optimizing the electrodeposition condition and bath composition as well as a Cu intermediate layer. The construction of the nanodot arrays were CoPt nanodot arrays (20 nm)/Cu (<5 nm)/CoZrNb (100 nm)/Cr (5 nm)/Glass disk. Magnetic signals were clearly observed on the dc magnetized state and multi domain were observed in each nanodot on the ac magnetized state by magnetic force microscopy (MFM). The perpendicular coercivity of the CoPt nanodot arrays was 430 kA/m. These results showed electrochemical process can be used for the manufacture of magnetic recording media.
AB - This paper describes the fabrication process of CoPt nandot arrays on a glass disk substrate with a CoZrNb underlayer as a soft magnetic underlayer (SUL) by using an electrochemical process, and also the analysis on the magnetic properties of these fabricated CoPt nanodot arrays. We formed nano-patterned substrates by UV-nanoimprint lithography (UV-NIL) on the glass disk substrate. CoPt was electrodeposited into the nano-patterned substrates optimizing the electrodeposition condition and bath composition as well as a Cu intermediate layer. The construction of the nanodot arrays were CoPt nanodot arrays (20 nm)/Cu (<5 nm)/CoZrNb (100 nm)/Cr (5 nm)/Glass disk. Magnetic signals were clearly observed on the dc magnetized state and multi domain were observed in each nanodot on the ac magnetized state by magnetic force microscopy (MFM). The perpendicular coercivity of the CoPt nanodot arrays was 430 kA/m. These results showed electrochemical process can be used for the manufacture of magnetic recording media.
KW - Bit patterned media
KW - CoPt
KW - Electrodeposition
KW - Nano-imprint lithography
UR - http://www.scopus.com/inward/record.url?scp=77952814524&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=77952814524&partnerID=8YFLogxK
U2 - 10.1109/TMAG.2010.2040068
DO - 10.1109/TMAG.2010.2040068
M3 - Article
AN - SCOPUS:77952814524
VL - 46
SP - 2224
EP - 2227
JO - IEEE Transactions on Magnetics
JF - IEEE Transactions on Magnetics
SN - 0018-9464
IS - 6
M1 - 5467574
ER -