Electrochemical fabrication of CoPt nanodot arrays on glass disks by UV nanoimprint lithography

T. Ouchi, Y. Arikawa, J. Mizuno, S. Shoji, T. Homma

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

A fabrication process for CoPt nanodot arrays using an electrochemical approach was proposed. The nano-patterncd substrates were formed using electron beam lithography (EBL) and UV nanoimprint lithography (UV-NIL). CoPt was electrodeposited into nano-patterned Si substrates. CoPt nanodot arrays with 35 rail diameter and 50 nm pitch using EBL and 50 nm diameter and 100 nm pitch using UV-NIL were successfully fabricated. In addition, we attempted to apply 1 inch glass disk substrates with CoZrNb underlayer as soft magnetic underlayer (SUL). We focused on the surface condition of the underlayers to deposit CoPt with uniformity and high magnetic properties. As a result, CoPt nanodot arrays were successfully fabricated on a 1 inch glass disk substrate with SUL using thin Cu intermediate layers. From these results, it has been found that the combination of the UV-NIL and electrochemical processes is a candidate for the fabrication of ultra high-density magnetic recording media.

Original languageEnglish
Title of host publicationECS Transactions - Magnetic Materials, Processes and Devices 10 - 214th ECS Meeting
Pages57-64
Number of pages8
Edition45
DOIs
Publication statusPublished - 2009 Nov 23
EventMagnetic Materials, Processes and Devices 10 - 214th ECS Meeting - Honolulu, HI, United States
Duration: 2008 Oct 122008 Oct 17

Publication series

NameECS Transactions
Number45
Volume16
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

ConferenceMagnetic Materials, Processes and Devices 10 - 214th ECS Meeting
CountryUnited States
CityHonolulu, HI
Period08/10/1208/10/17

ASJC Scopus subject areas

  • Engineering(all)

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    Ouchi, T., Arikawa, Y., Mizuno, J., Shoji, S., & Homma, T. (2009). Electrochemical fabrication of CoPt nanodot arrays on glass disks by UV nanoimprint lithography. In ECS Transactions - Magnetic Materials, Processes and Devices 10 - 214th ECS Meeting (45 ed., pp. 57-64). (ECS Transactions; Vol. 16, No. 45). https://doi.org/10.1149/1.3140010