A fabrication process for CoPt nanodot arrays using an electrochemical approach was proposed. The nano-patterncd substrates were formed using electron beam lithography (EBL) and UV nanoimprint lithography (UV-NIL). CoPt was electrodeposited into nano-patterned Si substrates. CoPt nanodot arrays with 35 rail diameter and 50 nm pitch using EBL and 50 nm diameter and 100 nm pitch using UV-NIL were successfully fabricated. In addition, we attempted to apply 1 inch glass disk substrates with CoZrNb underlayer as soft magnetic underlayer (SUL). We focused on the surface condition of the underlayers to deposit CoPt with uniformity and high magnetic properties. As a result, CoPt nanodot arrays were successfully fabricated on a 1 inch glass disk substrate with SUL using thin Cu intermediate layers. From these results, it has been found that the combination of the UV-NIL and electrochemical processes is a candidate for the fabrication of ultra high-density magnetic recording media.