Electroless-deposited soft magnetic underlayer on silicon disk substrate for double-layered perpendicular magnetic recording media

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17 Citations (Scopus)

Abstract

A novel fabrication process of a soft magnetic underlayer (SUL) for a double-layered perpendicular magnetic recording medium was presented. The CoNiFeB SUL was deposited on a silicon disk substrate using an electroless deposition. The Ni seed layer for the electroless deposition was prepared by an electrochemical process. The surface of the deposited SUL was subjected to a chemical mechanical polishing to be flattened, and Ra value of the SUL was less than 0.4 nm. A magnetic domain structure greatly depended on the electroless deposition condition. Particularly, the control of an agitation speed during electroless deposition is much effective for the suppression of distinct domain walls appearing in CoNiFeB underlayers.

Original languageEnglish
Pages (from-to)292-297
Number of pages6
JournalJournal of Magnetism and Magnetic Materials
Volume287
Issue numberSPEC. ISS.
DOIs
Publication statusPublished - 2005 Feb

Fingerprint

electroless deposition
Magnetic recording
Electroless plating
magnetic recording
Silicon
silicon
Substrates
Magnetic domains
agitation
Chemical mechanical polishing
Domain walls
magnetic domains
polishing
domain wall
Seed
seeds
retarding
Fabrication
fabrication

Keywords

  • Electroless deposition
  • Perpendicular magnetic recording medium
  • Silicon disk
  • Soft magnetic underlayer

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

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title = "Electroless-deposited soft magnetic underlayer on silicon disk substrate for double-layered perpendicular magnetic recording media",
abstract = "A novel fabrication process of a soft magnetic underlayer (SUL) for a double-layered perpendicular magnetic recording medium was presented. The CoNiFeB SUL was deposited on a silicon disk substrate using an electroless deposition. The Ni seed layer for the electroless deposition was prepared by an electrochemical process. The surface of the deposited SUL was subjected to a chemical mechanical polishing to be flattened, and Ra value of the SUL was less than 0.4 nm. A magnetic domain structure greatly depended on the electroless deposition condition. Particularly, the control of an agitation speed during electroless deposition is much effective for the suppression of distinct domain walls appearing in CoNiFeB underlayers.",
keywords = "Electroless deposition, Perpendicular magnetic recording medium, Silicon disk, Soft magnetic underlayer",
author = "Tetsuya Osaka and Toru Asahi and Tokihiko Yokoshima and J. Kawaji",
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language = "English",
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T1 - Electroless-deposited soft magnetic underlayer on silicon disk substrate for double-layered perpendicular magnetic recording media

AU - Osaka, Tetsuya

AU - Asahi, Toru

AU - Yokoshima, Tokihiko

AU - Kawaji, J.

PY - 2005/2

Y1 - 2005/2

N2 - A novel fabrication process of a soft magnetic underlayer (SUL) for a double-layered perpendicular magnetic recording medium was presented. The CoNiFeB SUL was deposited on a silicon disk substrate using an electroless deposition. The Ni seed layer for the electroless deposition was prepared by an electrochemical process. The surface of the deposited SUL was subjected to a chemical mechanical polishing to be flattened, and Ra value of the SUL was less than 0.4 nm. A magnetic domain structure greatly depended on the electroless deposition condition. Particularly, the control of an agitation speed during electroless deposition is much effective for the suppression of distinct domain walls appearing in CoNiFeB underlayers.

AB - A novel fabrication process of a soft magnetic underlayer (SUL) for a double-layered perpendicular magnetic recording medium was presented. The CoNiFeB SUL was deposited on a silicon disk substrate using an electroless deposition. The Ni seed layer for the electroless deposition was prepared by an electrochemical process. The surface of the deposited SUL was subjected to a chemical mechanical polishing to be flattened, and Ra value of the SUL was less than 0.4 nm. A magnetic domain structure greatly depended on the electroless deposition condition. Particularly, the control of an agitation speed during electroless deposition is much effective for the suppression of distinct domain walls appearing in CoNiFeB underlayers.

KW - Electroless deposition

KW - Perpendicular magnetic recording medium

KW - Silicon disk

KW - Soft magnetic underlayer

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DO - 10.1016/j.jmmm.2004.10.086

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JF - Journal of Magnetism and Magnetic Materials

SN - 0304-8853

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