Electron-beam-induced decomposition mechanisms of high-sensitivity chlorinated resist ZEP520A

Tomoko Gowa Oyama, Kazuyuki Enomoto, Yuji Hosaka, Akihiro Oshima, Masakazu Washio, Seiichi Tagawa

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

ZEP520A (1 : 1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl - ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl - ions.

Original languageEnglish
Article number036501
JournalApplied Physics Express
Volume5
Issue number3
DOIs
Publication statusPublished - 2012 Mar 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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