Electron-beam-induced decomposition mechanisms of high-sensitivity chlorinated resist ZEP520A

Tomoko Gowa Oyama, Kazuyuki Enomoto, Yuji Hosaka, Akihiro Oshima, Masakazu Washio, Seiichi Tagawa

    Research output: Contribution to journalArticle

    14 Citations (Scopus)

    Abstract

    ZEP520A (1 : 1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl - ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl - ions.

    Original languageEnglish
    Article number036501
    JournalApplied Physics Express
    Volume5
    Issue number3
    DOIs
    Publication statusPublished - 2012 Mar

    Fingerprint

    cleavage
    Electron beams
    electron attachment
    electron beams
    Decomposition
    decomposition
    Radiolysis
    Electrons
    Electron beam lithography
    sensitivity
    Ions
    Gel permeation chromatography
    Chlorine
    Nuclear magnetic resonance spectroscopy
    Charge transfer
    Infrared spectroscopy
    Fourier transforms
    gel chromatography
    Copolymers
    Positive ions

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

    Cite this

    Electron-beam-induced decomposition mechanisms of high-sensitivity chlorinated resist ZEP520A. / Oyama, Tomoko Gowa; Enomoto, Kazuyuki; Hosaka, Yuji; Oshima, Akihiro; Washio, Masakazu; Tagawa, Seiichi.

    In: Applied Physics Express, Vol. 5, No. 3, 036501, 03.2012.

    Research output: Contribution to journalArticle

    Oyama, Tomoko Gowa ; Enomoto, Kazuyuki ; Hosaka, Yuji ; Oshima, Akihiro ; Washio, Masakazu ; Tagawa, Seiichi. / Electron-beam-induced decomposition mechanisms of high-sensitivity chlorinated resist ZEP520A. In: Applied Physics Express. 2012 ; Vol. 5, No. 3.
    @article{39bd6df47d1a4905a2fa2909c1db8f83,
    title = "Electron-beam-induced decomposition mechanisms of high-sensitivity chlorinated resist ZEP520A",
    abstract = "ZEP520A (1 : 1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl - ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl - ions.",
    author = "Oyama, {Tomoko Gowa} and Kazuyuki Enomoto and Yuji Hosaka and Akihiro Oshima and Masakazu Washio and Seiichi Tagawa",
    year = "2012",
    month = "3",
    doi = "10.1143/APEX.5.036501",
    language = "English",
    volume = "5",
    journal = "Applied Physics Express",
    issn = "1882-0778",
    publisher = "Japan Society of Applied Physics",
    number = "3",

    }

    TY - JOUR

    T1 - Electron-beam-induced decomposition mechanisms of high-sensitivity chlorinated resist ZEP520A

    AU - Oyama, Tomoko Gowa

    AU - Enomoto, Kazuyuki

    AU - Hosaka, Yuji

    AU - Oshima, Akihiro

    AU - Washio, Masakazu

    AU - Tagawa, Seiichi

    PY - 2012/3

    Y1 - 2012/3

    N2 - ZEP520A (1 : 1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl - ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl - ions.

    AB - ZEP520A (1 : 1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl - ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl - ions.

    UR - http://www.scopus.com/inward/record.url?scp=84858633934&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=84858633934&partnerID=8YFLogxK

    U2 - 10.1143/APEX.5.036501

    DO - 10.1143/APEX.5.036501

    M3 - Article

    AN - SCOPUS:84858633934

    VL - 5

    JO - Applied Physics Express

    JF - Applied Physics Express

    SN - 1882-0778

    IS - 3

    M1 - 036501

    ER -