Electron diffusion and scintillation in xenon doped with hydrogen for high-pressure xenon time projection chamber

C. Tezuka*, Nobuyuki Hasebe, S. Kobayashi, T. Igarashi, M. Mimura, T. Hosojima, M. N. Kobayashi, T. Doke, M. Miyajima, T. Miyach, H. Okada, E. Shibamura, K. N. Pushkin, S. E. Ulin

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    2 Citations (Scopus)

    Abstract

    High-pressure xenon time projection chamber (HPXe-TPC) is a sophisticated detector, which can determine not only an energy of gamma ray but also its arrival direction by using Compton scattering. Diffusion of electrons and scintillation yield in Xe and Xe+H 2 mixture have been investigated to realize a HPXe-TPC. The transverse characteristic energy of electrons in Xe+H 2 mixture (H 2 0.44%) was reduced to about 40% against that of pure Xe at 1.0 MPa. Scintillation yields by alpha-particles ( 241Am) in Xe+H 2 mixture (H 2 0.23-5.7%) at 2.6 MPa were obtained as a function of E/N. The scintillation yields in Xe+H 2 mixture at 2.6 MPa and at E/N =0.3×10 -17Vcm 2 were luminous enough to generate a trigger signal of a HPXe-TPC. It is found that doping hydrogen into xenon is effective to prevent the degradation of angular resolution of a HPXe-TPC.

    Original languageEnglish
    Title of host publicationIEEE Nuclear Science Symposium Conference Record
    EditorsJ.A. Seibert
    Pages1157-1159
    Number of pages3
    Volume2
    Publication statusPublished - 2004
    Event2004 Nuclear Science Symposium, Medical Imaging Conference, Symposium on Nuclear Power Systems and the 14th International Workshop on Room Temperature Semiconductor X- and Gamma- Ray Detectors - Rome, Italy
    Duration: 2004 Oct 162004 Oct 22

    Other

    Other2004 Nuclear Science Symposium, Medical Imaging Conference, Symposium on Nuclear Power Systems and the 14th International Workshop on Room Temperature Semiconductor X- and Gamma- Ray Detectors
    Country/TerritoryItaly
    CityRome
    Period04/10/1604/10/22

    ASJC Scopus subject areas

    • Computer Vision and Pattern Recognition
    • Industrial and Manufacturing Engineering

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