Electronic breakdown process of plasma polymer films

T. Nakano, M. Fukuyama, H. Hayashi, K. Ishii, Yoshimichi Ohki

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    It has been suggested that when dielectric breakdown is caused by an electronic process, the scattering of electrons will increase the dielectric strength. To confirm this, polar groups were introduced into plasma-polymer films, assuming that the polar groups would act as scattering centers, and the dielectric strength was measured. It was found that when the breakdown process is electronic, the breakdown field increases due to the introduction of an appropriate number of electron scattering centers such as nitrogen and fluorine.

    Original languageEnglish
    Title of host publicationProc 3rd Int Conf Conduct Breakdown Solid Dielectr
    Editors Anon
    Place of PublicationPiscataway, NJ, United States
    PublisherPubl by IEEE
    Pages82-86
    Number of pages5
    Publication statusPublished - 1989
    EventProceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics - Trondheim, Norway
    Duration: 1989 Jul 31989 Jul 6

    Other

    OtherProceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics
    CityTrondheim, Norway
    Period89/7/389/7/6

    Fingerprint

    Polymer films
    Scattering
    Plasmas
    Electron scattering
    Electric breakdown
    Fluorine
    Nitrogen
    Electrons

    ASJC Scopus subject areas

    • Engineering(all)

    Cite this

    Nakano, T., Fukuyama, M., Hayashi, H., Ishii, K., & Ohki, Y. (1989). Electronic breakdown process of plasma polymer films. In Anon (Ed.), Proc 3rd Int Conf Conduct Breakdown Solid Dielectr (pp. 82-86). Piscataway, NJ, United States: Publ by IEEE.

    Electronic breakdown process of plasma polymer films. / Nakano, T.; Fukuyama, M.; Hayashi, H.; Ishii, K.; Ohki, Yoshimichi.

    Proc 3rd Int Conf Conduct Breakdown Solid Dielectr. ed. / Anon. Piscataway, NJ, United States : Publ by IEEE, 1989. p. 82-86.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Nakano, T, Fukuyama, M, Hayashi, H, Ishii, K & Ohki, Y 1989, Electronic breakdown process of plasma polymer films. in Anon (ed.), Proc 3rd Int Conf Conduct Breakdown Solid Dielectr. Publ by IEEE, Piscataway, NJ, United States, pp. 82-86, Proceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics, Trondheim, Norway, 89/7/3.
    Nakano T, Fukuyama M, Hayashi H, Ishii K, Ohki Y. Electronic breakdown process of plasma polymer films. In Anon, editor, Proc 3rd Int Conf Conduct Breakdown Solid Dielectr. Piscataway, NJ, United States: Publ by IEEE. 1989. p. 82-86
    Nakano, T. ; Fukuyama, M. ; Hayashi, H. ; Ishii, K. ; Ohki, Yoshimichi. / Electronic breakdown process of plasma polymer films. Proc 3rd Int Conf Conduct Breakdown Solid Dielectr. editor / Anon. Piscataway, NJ, United States : Publ by IEEE, 1989. pp. 82-86
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