It has been suggested that when dielectric breakdown is caused by an electronic process, the scattering of electrons will increase the dielectric strength. To confirm this, polar groups were introduced into plasma-polymer films, assuming that the polar groups would act as scattering centers, and the dielectric strength was measured. It was found that when the breakdown process is electronic, the breakdown field increases due to the introduction of an appropriate number of electron scattering centers such as nitrogen and fluorine.
|Number of pages||5|
|Publication status||Published - 1989 Dec 1|
|Event||Proceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics - Trondheim, Norway|
Duration: 1989 Jul 3 → 1989 Jul 6
|Other||Proceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics|
|Period||89/7/3 → 89/7/6|
ASJC Scopus subject areas