Electronic breakdown process of plasma polymer films

T. Nakano, M. Fukuyama, H. Hayashi, K. Ishii, Y. Ohki

Research output: Contribution to conferencePaper

Abstract

It has been suggested that when dielectric breakdown is caused by an electronic process, the scattering of electrons will increase the dielectric strength. To confirm this, polar groups were introduced into plasma-polymer films, assuming that the polar groups would act as scattering centers, and the dielectric strength was measured. It was found that when the breakdown process is electronic, the breakdown field increases due to the introduction of an appropriate number of electron scattering centers such as nitrogen and fluorine.

Original languageEnglish
Pages82-86
Number of pages5
Publication statusPublished - 1989 Dec 1
EventProceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics - Trondheim, Norway
Duration: 1989 Jul 31989 Jul 6

Other

OtherProceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics
CityTrondheim, Norway
Period89/7/389/7/6

ASJC Scopus subject areas

  • Engineering(all)

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    Nakano, T., Fukuyama, M., Hayashi, H., Ishii, K., & Ohki, Y. (1989). Electronic breakdown process of plasma polymer films. 82-86. Paper presented at Proceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics, Trondheim, Norway, .