Abstract
Oxidation of silicon by collimated hyperthermal ozone beam produced by pulsed-laser ablation of solid ozone, was reported. This led to decrease in the process temperature and increase in the controllability of oxidation. Laser shots, to which the number of supplied ozone molecules were propotional, were used to control the oxidation rate. Higher oxidation efficieny was reported in comparison with that by using continuous ozone spray with thermal energy.
Original language | English |
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Pages (from-to) | 382-384 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 79 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2001 Jul 16 |
Externally published | Yes |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)