Enhancement of nanovoid formation in annealed amorphous Al 2O3 including W

R. Nakamura, M. Ishimaru, Akihiko Hirata, K. Sato, M. Tane, H. Kimizuka, T. Shudo, T. J. Konno, H. Nakajima

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The effect of W on the nanovoid formation in annealed amorphous Al 2O3 was studied by transmission electron microscopy and molecular dynamics simulations. A comparison of the void formation behavior in electron-beam deposited Al2O3 (without W) and resistance-heating deposited Al2O3 (with 10 at. W) revealed that W enhances the formation and growth of nanovoids. An analysis of the pair distribution function (PDF) in both types of amorphous Al 2O3 showed that the introduction of W into amorphous Al2O3 brings about a significant change in the amorphous structure. Furthermore, it was found by high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) that sub-nm sized W clusters exist in as-deposited Al2O3 prepared by resistance-heating and then dissolve in the amorphous matrix with annealing. The combination of PDF analysis and HAADF-STEM observation provides evidence that the enhancement of void formation originates in the heterogeneous short-range atomic configurations induced by the addition of W.

Original languageEnglish
Article number064324
JournalJournal of Applied Physics
Volume110
Issue number6
DOIs
Publication statusPublished - 2011 Sep 15
Externally publishedYes

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resistance heating
augmentation
transmission electron microscopy
voids
distribution functions
scanning electron microscopy
electron beams
molecular dynamics
annealing
matrices
configurations
simulation

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Nakamura, R., Ishimaru, M., Hirata, A., Sato, K., Tane, M., Kimizuka, H., ... Nakajima, H. (2011). Enhancement of nanovoid formation in annealed amorphous Al 2O3 including W. Journal of Applied Physics, 110(6), [064324]. https://doi.org/10.1063/1.3639290

Enhancement of nanovoid formation in annealed amorphous Al 2O3 including W. / Nakamura, R.; Ishimaru, M.; Hirata, Akihiko; Sato, K.; Tane, M.; Kimizuka, H.; Shudo, T.; Konno, T. J.; Nakajima, H.

In: Journal of Applied Physics, Vol. 110, No. 6, 064324, 15.09.2011.

Research output: Contribution to journalArticle

Nakamura, R, Ishimaru, M, Hirata, A, Sato, K, Tane, M, Kimizuka, H, Shudo, T, Konno, TJ & Nakajima, H 2011, 'Enhancement of nanovoid formation in annealed amorphous Al 2O3 including W', Journal of Applied Physics, vol. 110, no. 6, 064324. https://doi.org/10.1063/1.3639290
Nakamura, R. ; Ishimaru, M. ; Hirata, Akihiko ; Sato, K. ; Tane, M. ; Kimizuka, H. ; Shudo, T. ; Konno, T. J. ; Nakajima, H. / Enhancement of nanovoid formation in annealed amorphous Al 2O3 including W. In: Journal of Applied Physics. 2011 ; Vol. 110, No. 6.
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