Epitaxial growth of high quality ZnSe on Si substrates by molecular beam epitaxy and application to dc electroluminescent cells

Naoki Mino, Masakazu Kobayashi, Makoto Konagai, Kiyoshi Takahashi

Research output: Contribution to journalArticle

29 Citations (Scopus)

Abstract

ZnSe thin films were grown on (100) and (111) oriented Si substrates by molecular beam epitaxy. The single-crystalline ZnSe films were obtained in the substrate temperature range of 300-450°C. The epitaxial layers were evaluated by reflection high-energy electron diffraction, x-ray diffraction, etch pit density, photoluminescence, and Hall effect measurements. Etch pit density was estimated to be 3×105 cm-2. The carrier concentration and electron mobility of the epitaxial ZnSe layers at room temperature are 1.3×1017-2.8×10 17 cm-3 and 170-250 cm2/V s, respectively. These epitaxial films were applied to Au/ZnSe:Mn/Si dc-operated electroluminescent cells. The maximum quantum efficiency of 2.2×10-2 (30.4 V, 6.3×10- 5 A/cm2) was achieved.

Original languageEnglish
Pages (from-to)793-796
Number of pages4
JournalJournal of Applied Physics
Volume58
Issue number2
DOIs
Publication statusPublished - 1985 Dec 1

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Epitaxial growth of high quality ZnSe on Si substrates by molecular beam epitaxy and application to dc electroluminescent cells'. Together they form a unique fingerprint.

  • Cite this