EUV laser irradiation system with intensity monitor

M. Ishino*, T. H. Dinh, N. Hasegawa, K. Sakaue, T. Higashiguchi, S. Ichimaru, M. Hatayama, M. Washio, M. Nishikino, T. Kawachi

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have developed an extreme ultraviolet (EUV) laser irradiation system at QST. EUV laser has a wavelength of 13.9 nm, and this laser wavelength is close to the wavelength of EUV lithography (λ = 13.5 nm). The irradiation system has an intensity monitor based on the Mo/Si multilayer beam splitter. This intensity monitor provides the irradiation energy onto the sample surface. So it is possible to examine and confirm damage/ablation thresholds of optical elements and doses for the sensitivity of resist materials, which have the same specifications of those in the EUV lithography.

Original languageEnglish
Title of host publicationX-Ray Lasers 2018 - Proceedings of the 16th International Conference on X-Ray Lasers
EditorsMichaela Kozlová, Jaroslav Nejdl
PublisherSpringer
Pages61-66
Number of pages6
ISBN (Print)9783030354527
DOIs
Publication statusPublished - 2020
Event16th International Conference on X-Ray Lasers, ICXRL 2018 - Prague, Czech Republic
Duration: 2018 Oct 72018 Oct 12

Publication series

NameSpringer Proceedings in Physics
Volume241
ISSN (Print)0930-8989
ISSN (Electronic)1867-4941

Conference

Conference16th International Conference on X-Ray Lasers, ICXRL 2018
Country/TerritoryCzech Republic
CityPrague
Period18/10/718/10/12

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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