Evaluation of inverse tangent phase mask in wavefront coding

Masaya Takahashi, Shinichi Komatsu

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    An inverse tangential phase mask (ITPM) is potentially effective for extending the depth of field in the wavefront coding method. However, its characteristics have not been reported in detail. In this study, we obtained the ITPM profile function and confirmed that the optimized ITPM is more effective than a cubic phase mask (CPM) in several respects.

    Original languageEnglish
    Title of host publication22nd Microoptics Conference, MOC 2017
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages158-159
    Number of pages2
    Volume2017-November
    ISBN (Electronic)9784863486096
    DOIs
    Publication statusPublished - 2018 Jan 2
    Event22nd Microoptics Conference, MOC 2017 - Tokyo, Japan
    Duration: 2017 Nov 192017 Nov 22

    Other

    Other22nd Microoptics Conference, MOC 2017
    CountryJapan
    CityTokyo
    Period17/11/1917/11/22

    Fingerprint

    Wavefronts
    tangents
    Masks
    coding
    masks
    evaluation
    profiles

    ASJC Scopus subject areas

    • Atomic and Molecular Physics, and Optics
    • Electronic, Optical and Magnetic Materials

    Cite this

    Takahashi, M., & Komatsu, S. (2018). Evaluation of inverse tangent phase mask in wavefront coding. In 22nd Microoptics Conference, MOC 2017 (Vol. 2017-November, pp. 158-159). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.23919/MOC.2017.8244536

    Evaluation of inverse tangent phase mask in wavefront coding. / Takahashi, Masaya; Komatsu, Shinichi.

    22nd Microoptics Conference, MOC 2017. Vol. 2017-November Institute of Electrical and Electronics Engineers Inc., 2018. p. 158-159.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Takahashi, M & Komatsu, S 2018, Evaluation of inverse tangent phase mask in wavefront coding. in 22nd Microoptics Conference, MOC 2017. vol. 2017-November, Institute of Electrical and Electronics Engineers Inc., pp. 158-159, 22nd Microoptics Conference, MOC 2017, Tokyo, Japan, 17/11/19. https://doi.org/10.23919/MOC.2017.8244536
    Takahashi M, Komatsu S. Evaluation of inverse tangent phase mask in wavefront coding. In 22nd Microoptics Conference, MOC 2017. Vol. 2017-November. Institute of Electrical and Electronics Engineers Inc. 2018. p. 158-159 https://doi.org/10.23919/MOC.2017.8244536
    Takahashi, Masaya ; Komatsu, Shinichi. / Evaluation of inverse tangent phase mask in wavefront coding. 22nd Microoptics Conference, MOC 2017. Vol. 2017-November Institute of Electrical and Electronics Engineers Inc., 2018. pp. 158-159
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