Evaluation of lasing temperature characteristics of 1550nm QD-based-LDs by IID-QDI technique with ar and b ions and high temperature stability

A. Matsumoto*, S. Isawa, R. Kaneko, K. Akahane, T. Umezawa, Y. Matsushima, K. Utaka

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We evaluated temperature characteristics of QD-based-LDs by ion-implantation-induced-disordering quantum-dot intermixing technique with Ar and B ions, and demonstrated high temperature stability with a characteristic temperature of 284 K and a wavelength shift of 0.15 nm/°C.

Original languageEnglish
Title of host publicationCLEO
Subtitle of host publicationApplications and Technology, CLEO_AT 2020
PublisherOSA - The Optical Society
ISBN (Electronic)9781557528209
DOIs
Publication statusPublished - 2020
EventCLEO: Applications and Technology, CLEO_AT 2020 - Washington, United States
Duration: 2020 May 102020 May 15

Publication series

NameOptics InfoBase Conference Papers
VolumePart F181-CLEO-AT 2020

Conference

ConferenceCLEO: Applications and Technology, CLEO_AT 2020
Country/TerritoryUnited States
CityWashington
Period20/5/1020/5/15

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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