Evaluation of outermost surface temperature of silicon substrates during UV-excited ozone oxidation at low temperature

Naoto Kameda^*, Tetsuya Nishiguchi, Yoshiki Morikawa, Mitsuru Kekura, Ken Nakamura, Tomoharu Ushiyama, Hidehiko Nonaka, Shingo Ichimura

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review