Evaluation of strained-silicon by electron backscattering pattern measurement: Comparison study with UV-raman measurement and edge force model calculation

Motohiro Tomita*, Daisuke Kosemura, Munehisa Takei, Kohki Nagata, Hiroaki Akamatsu, Atsushi Ogura

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

26 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy