Examination of ferroelectric and magnetic properties of hexagonal ErFeO3 thin films

Hiroko Yokota, Tomoya Nozue, Shin Nakamura, Mamoru Fukunaga, Akio Fuwa

    Research output: Contribution to journalArticle

    4 Citations (Scopus)

    Abstract

    Hexagonal ErFeO3 (h-ErFeO3) thin films were fabricated by a pulsed laser deposition method. X-ray diffraction experiments confirmed that singlephase h-ErFeO3 thin films were successfully obtained and were c axis-oriented. Ferroelectricity was confirmed by D-E hysteresis loop measurement at room temperature and the magnitude of spontaneous polarization was estimated to be 200 nC/cm2. A weak ferromagnetism appeared below 120K and dielectric constants started to exhibit magnetic field dependence. These observations demonstrate the coexistence of ferroelectricity and weak ferromagnetism in h-ErFeO3 thin films.

    Original languageEnglish
    Article number10NA10
    JournalJapanese Journal of Applied Physics
    Volume54
    Issue number10
    DOIs
    Publication statusPublished - 2015 Oct 1

    Fingerprint

    Ferroelectric materials
    Ferroelectricity
    Magnetic properties
    examination
    Ferromagnetism
    ferroelectricity
    magnetic properties
    Thin films
    ferromagnetism
    thin films
    Pulsed laser deposition
    Hysteresis loops
    pulsed laser deposition
    Permittivity
    hysteresis
    Polarization
    permittivity
    Magnetic fields
    X ray diffraction
    room temperature

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

    Cite this

    Examination of ferroelectric and magnetic properties of hexagonal ErFeO3 thin films. / Yokota, Hiroko; Nozue, Tomoya; Nakamura, Shin; Fukunaga, Mamoru; Fuwa, Akio.

    In: Japanese Journal of Applied Physics, Vol. 54, No. 10, 10NA10, 01.10.2015.

    Research output: Contribution to journalArticle

    Yokota, Hiroko ; Nozue, Tomoya ; Nakamura, Shin ; Fukunaga, Mamoru ; Fuwa, Akio. / Examination of ferroelectric and magnetic properties of hexagonal ErFeO3 thin films. In: Japanese Journal of Applied Physics. 2015 ; Vol. 54, No. 10.
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