Experimental verification of pH localization mechanism of particle consolidation at the electrode/solution interface and its application to pulsed DC electrophoretic deposition (EPD)

Laxmidhar Besra, Tetsuo Uchikoshi, Tohru Suzuki, Yoshio Sakka

Research output: Contribution to journalArticle

50 Citations (Scopus)

Abstract

Experimental measurement and verification of the pH localization at the electrode/solution interface was conducted during continuous and pulsed DC electrophoretic deposition (EPD) from aqueous solution. Application of pulsed DC enabled controlling bubble incorporation and obtaining bubble-free deposits during electrophoretic deposition (EPD) from aqueous suspension. The pH localization at the electrode/solution interface on application of electric field was attributed as the underlying mechanism of particle consolidation during continuous as well as pulsed EPD. The suspension pH tends to shift towards isoelectric point (i.e.p.) leading to spontaneous coagulation of particles at the electrode. Application of continuous DC tends to attain the i.e.p. faster and closer compared to pulse DC leading to maximum deposit yield. The kinetics and closeness of attainment of pH towards i.e.p. decreased progressively with decreasing pulse size resulting in a corresponding decrease in deposit yield.

Original languageEnglish
Pages (from-to)1187-1193
Number of pages7
JournalJournal of the European Ceramic Society
Volume30
Issue number5
DOIs
Publication statusPublished - 2010 Mar 1
Externally publishedYes

Fingerprint

Consolidation
Particles (particulate matter)
Deposits
Electrodes
Suspensions
Coagulation
Bubbles (in fluids)
Electric fields
Kinetics

Keywords

  • Aqueous suspension
  • Electrolysis
  • Electrophoretic deposition
  • pH localization
  • Pulse DC

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry

Cite this

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abstract = "Experimental measurement and verification of the pH localization at the electrode/solution interface was conducted during continuous and pulsed DC electrophoretic deposition (EPD) from aqueous solution. Application of pulsed DC enabled controlling bubble incorporation and obtaining bubble-free deposits during electrophoretic deposition (EPD) from aqueous suspension. The pH localization at the electrode/solution interface on application of electric field was attributed as the underlying mechanism of particle consolidation during continuous as well as pulsed EPD. The suspension pH tends to shift towards isoelectric point (i.e.p.) leading to spontaneous coagulation of particles at the electrode. Application of continuous DC tends to attain the i.e.p. faster and closer compared to pulse DC leading to maximum deposit yield. The kinetics and closeness of attainment of pH towards i.e.p. decreased progressively with decreasing pulse size resulting in a corresponding decrease in deposit yield.",
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T1 - Experimental verification of pH localization mechanism of particle consolidation at the electrode/solution interface and its application to pulsed DC electrophoretic deposition (EPD)

AU - Besra, Laxmidhar

AU - Uchikoshi, Tetsuo

AU - Suzuki, Tohru

AU - Sakka, Yoshio

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Y1 - 2010/3/1

N2 - Experimental measurement and verification of the pH localization at the electrode/solution interface was conducted during continuous and pulsed DC electrophoretic deposition (EPD) from aqueous solution. Application of pulsed DC enabled controlling bubble incorporation and obtaining bubble-free deposits during electrophoretic deposition (EPD) from aqueous suspension. The pH localization at the electrode/solution interface on application of electric field was attributed as the underlying mechanism of particle consolidation during continuous as well as pulsed EPD. The suspension pH tends to shift towards isoelectric point (i.e.p.) leading to spontaneous coagulation of particles at the electrode. Application of continuous DC tends to attain the i.e.p. faster and closer compared to pulse DC leading to maximum deposit yield. The kinetics and closeness of attainment of pH towards i.e.p. decreased progressively with decreasing pulse size resulting in a corresponding decrease in deposit yield.

AB - Experimental measurement and verification of the pH localization at the electrode/solution interface was conducted during continuous and pulsed DC electrophoretic deposition (EPD) from aqueous solution. Application of pulsed DC enabled controlling bubble incorporation and obtaining bubble-free deposits during electrophoretic deposition (EPD) from aqueous suspension. The pH localization at the electrode/solution interface on application of electric field was attributed as the underlying mechanism of particle consolidation during continuous as well as pulsed EPD. The suspension pH tends to shift towards isoelectric point (i.e.p.) leading to spontaneous coagulation of particles at the electrode. Application of continuous DC tends to attain the i.e.p. faster and closer compared to pulse DC leading to maximum deposit yield. The kinetics and closeness of attainment of pH towards i.e.p. decreased progressively with decreasing pulse size resulting in a corresponding decrease in deposit yield.

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